⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12651232 | 0.85 | — | — | |
| SCHEMBL21249296 | 0.84 | — | — | |
| SCHEMBL685732 | 0.84 | TSHR (0.32) | — | |
| SCHEMBL17186178 | 0.84 | POLB (0.33) | — | |
| SCHEMBL3791418 | 0.82 | EDNRA (0.32) | — | |
| SCHEMBL1697107 | 0.82 | TSHR (0.36) | — | |
| SCHEMBL12650667 | 0.81 | — | — | |
| SCHEMBL5408979 | 0.81 | CYP3A4 (0.34) | — | |
| SCHEMBL7608803 | 0.80 | — | — | |
| SCHEMBL5872361 | 0.78 | MAPK1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 253 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104334536-A | Method for producing beta-(meth)acryloyloxy-gamma-butyrolactone | JNC CORP | 2015-02-04 | — | — | CN | claimed |
| CN-113614073-B | Polymer, resist composition, method for producing patterned substrate, and method for producing (meth) acrylate | 三菱化学株式会社 | 2024-09-24 | — | — | CN | disclosed |
| CN-113614073-A | Polymer, resist composition, method for producing substrate having pattern formed thereon, and (meth) acrylate and method for producing same | 三菱化学株式会社 | 2021-11-05 | — | — | CN | disclosed |
| US-10377692-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-08-13 | — | — | US | disclosed |
| US-9726976-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9726976-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-20170037169-A1 | MANUFACTURING METHOD OF POLYMER | TOYO GOSEI CO., LTD. (JP) | 2017-02-09 | — | — | US | disclosed |
| US-9405187-B2 | Salt, acid generator and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9405187-B2 | Salt, acid generator and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| CN-102736418-B | For the composition of coating on photo-resist pattern | 默克专利有限公司 | 2016-06-08 | — | — | CN | disclosed |
| CN-100363343-C | Photoactive compounds | AZ ELECTRONIC MATERIALS USA (US) | 2008-01-23 | — | — | CN | disclosed |
| CN-100354257-C | Sulfonate and a resist composition | SUMITOMO CHEMICAL CO (JP) | 2007-12-12 | — | — | CN | disclosed |
| US-20070218401-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-09-20 | — | — | US | disclosed |
| US-20070218401-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-09-20 | — | — | US | disclosed |
| US-7223516-B2 | Positive type photoresist composition | FUJIFILM CORPORATION (JP) | 2007-05-29 | — | — | US | disclosed |
| US-7223516-B2 | Positive type photoresist composition | FUJIFILM CORPORATION (JP) | 2007-05-29 | — | — | US | disclosed |
| CN-1791573-A | Photoactive compounds | AZ ELECTRONIC MATERIALS USA (US) | 2006-06-21 | — | — | CN | disclosed |
| CN-1757670-A | Radial sensitive resin composite, microlens and manufacturing method therof and liquid crystal display element | JSR CORP (JP) | 2006-04-12 | — | — | CN | disclosed |
| CN-1745114-A | Resist polymer and resist composition | MITSUBISHI RAYON CO (JP) | 2006-03-08 | — | — | CN | disclosed |
| CN-1576272-A | Sulfonate and a resist composition | SUMITOMO CHEMICAL CO (JP) | 2005-02-09 | — | — | CN | disclosed |