Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 6/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.34 |
| ▸ | MAPT | P10636 | 4/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 4/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL685956 | 0.81 | — | — | |
| SCHEMBL3163806 | 0.78 | ALDH1A1 (0.36) | CYP3A4CYP2C9CYP2D6MAPTCYP2C19 | |
| SCHEMBL7608803 | 0.78 | — | — | |
| SCHEMBL1173848 | 0.78 | CYP3A4 (0.30) | CYP3A4CYP2C9CYP2D6 | |
| SCHEMBL22086825 | 0.75 | CYP2D6 (0.43) | CYP3A4CYP2C9CYP2D6MAPTCYP2C19 | |
| SCHEMBL12211692 | 0.75 | TSHR (0.31) | TSHR | |
| SCHEMBL23963276 | 0.74 | — | — | |
| SCHEMBL23963264 | 0.74 | — | — | |
| SCHEMBL31534014 | 0.73 | POLB (0.32) | — | |
| SCHEMBL10259018 | 0.73 | FKBP1A (0.34) | CYP3A4CYP2C9CYP2D6MAPTCYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8030419-B2 | Process for producing polymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-7695889-B2 | Copolymer for semiconductor lithography and process for production thereof | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-04-13 | — | — | US | disclosed |
| US-7695889-B2 | Copolymer for semiconductor lithography and process for production thereof | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-04-13 | — | — | US | disclosed |
| US-20100048848-A1 | PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-7205090-B2 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-17 | — | — | US | disclosed |
| US-20050158656-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2005-07-21 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |