SCHEMBL6859810

SCHEMBL6859810

CCCCC(COc1ccc(C(C)(C)c2ccc(OCC(CCCC)OCC3CO3)cc2)cc1)OCC1CO1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.59
ALDH1A1 P00352 3/20 0.59
TP53 P04637 2/20 0.59
MAPT P10636 2/20 0.59
HPGD P15428 2/20 0.59
TSHR P16473 2/20 0.59
MEN1 O00255 2/20 0.59
HIF1A Q16665 2/20 0.59
CYP1A2 P05177 1/20 0.59
PPARG P37231 1/20 0.59
HTT P42858 1/20 0.40
AR P10275 2/20 0.39
SMN1; SMN2 Q16637 1/20 0.36
TDP1 Q9NUW8 1/20 0.35
LMNA P02545 2/20 0.35
HSD17B10 Q99714 1/20 0.35
PKM P14618 2/20 0.35
GAA P10253 1/20 0.35
PLA2G2A P14555 4/20 0.34
PPARD Q03181 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6856647 0.91 ALDH1A1 (0.59) KMT2AALDH1A1TP53MAPTHPGD
SCHEMBL6858467 0.88 TSHR (0.62) KMT2AALDH1A1TP53MAPTHPGD
SCHEMBL6859802 0.87 TP53 (0.55) KMT2AALDH1A1TP53MAPTHPGD
SCHEMBL6858505 0.87 TP53 (0.55) KMT2AALDH1A1TP53MAPTHPGD
SCHEMBL6851768 0.85 KMT2A (0.65) KMT2AALDH1A1TP53MAPTHPGD
SCHEMBL6858978 0.85 KMT2A (0.71) KMT2AALDH1A1TP53MAPTHPGD
SCHEMBL16489885 0.85 ALDH1A1 (0.65) KMT2AALDH1A1TP53MAPTHPGD
SCHEMBL16489883 0.84 TP53 (0.64) KMT2AALDH1A1TP53MAPTHPGD
SCHEMBL10049658 0.84 TP53 (0.64) KMT2AALDH1A1TP53MAPTHPGD
SCHEMBL22688279 0.83 KMT2A (0.76) KMT2AALDH1A1TP53MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6783809-B2 LOW VISCOSITY PHOTOCURABLE COMPOSITIONS WHICH, WHEN FULLY CURED, GIVE MOULDED ARTICLES OF EXCELLENT FLEXIBILITY HUNTSMAN ADVANCED MATERIALS AMERICAS INC. 2004-08-31 US disclosed
US-20020068801-A1 Photosensitive diacrylate and dimethacrylate compositions HUNTSMAN INTERNATIONAL LLC 2002-06-06 US disclosed
US-6316552-B1 USED IN PHOTOSENSITIVE FORMULATIONS WHICH ARE USED IN PREPARATION OF THREE-DIMENSIONAL OBJECTS VANTICO INC. 2001-11-13 US disclosed
US-6043323-A LOW VISCOSITY PHOTOCURABLE COMPOSITIONS WHICH, WHEN FULLY CURED, GIVE MOULDED ARTICLES OF EXCELLENT FLEXIBILITY. CIBA SPECIALTY CHEMICALS CORP. (US) 2000-03-28 US disclosed
EP-0554215-B1 Diacrylates and dimethacrylates CIBA GEIGY AG (CH) 1997-01-02 EP disclosed
EP-0554215-A2 Diacrylates and dimethacrylates CIBA-GEIGY AG (CH) 1993-08-04 EP disclosed