SCHEMBL6860790

SCHEMBL6860790

CC[C](O)C(C)C#N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16245752 0.72
SCHEMBL1665028 0.72
SCHEMBL825523 0.70
Butane SCHEMBL3248202 0.69 HDAC1 (0.39)
SCHEMBL28025306 0.67
SCHEMBL185750 0.65
SCHEMBL9494396 0.65
SCHEMBL10612766 0.65
SCHEMBL9497647 0.65
Propionic Acid SCHEMBL28712841 0.63 FFAR3 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3705500-B1 METHOD FOR MANUFACTURING 2-CYANOETHYL GROUP-CONTAINING POLYMER LG CHEMICAL LTD (KR) 2024-05-29 EP disclosed
WO-2023054114-A1 HIGH-FREQUENCY DIELECTRIC HEATING ADHESIVE リンテック株式会社 2023-04-06 WO disclosed
US-20210054114-A1 Method for Preparing 2-Cyanoethyl Group-Containing Polymer LG CHEM, LTD. (KR) 2021-02-25 US disclosed
EP-3705500-A1 METHOD FOR MANUFACTURING 2-CYANOETHYL GROUP-CONTAINING POLYMER LG CHEM, LTD. (KR) 2020-09-09 EP disclosed
US-6835889-B2 Passive element component and substrate with built-in passive element KABUSHIKI KAISHA TOSHIBA (JP) 2004-12-28 US disclosed
US-20030107465-A1 Passive element component and substrate with built-in passive element KABUSHIKI KAISHA TOSHIBA (JP) 2003-06-12 US disclosed
US-4027345-A Transfer printing TOYO BOSEKI KABUSHIKI KAISHA (JA) 1977-06-07 US disclosed