Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB2 | P17787 | 2/20 | 0.38 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.38 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.38 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.38 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.38 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.35 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.35 |
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.32 |
| ▸ | PPARG | P37231 | 1/20 | 0.32 |
| ▸ | PPARA | Q07869 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.31 |
| ▸ | NPC1 | O15118 | 2/20 | 0.31 |
| ▸ | MTOR | P42345 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL134315 | 0.84 | CHRNB2 (0.42) | CHRNB2CHRNA7CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL7941374 | 0.83 | CHRNB2 (0.40) | CHRNB2CHRNA7CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL9412357 | 0.83 | CHRNB2 (0.38) | CHRNB2CHRNA7CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL1357310 | 0.82 | TP53 (0.41) | ALDH1A1CYP2D6TP53CYP3A4CYP2C9 | |
| SCHEMBL24355011 | 0.81 | CHRNB2 (0.37) | CHRNB2CHRNA7CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL5693040 | 0.81 | CHRNB2 (0.44) | CHRNB2CHRNA7CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL23559184 | 0.80 | CHRNB2 (0.40) | CHRNB2CHRNA7CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL5900997 | 0.80 | CHRNB2 (0.43) | CHRNB2CHRNA7CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL5901182 | 0.80 | CHRNB2 (0.36) | CHRNB2CHRNA7CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL7539425 | 0.80 | CHRNB2 (0.40) | CHRNB2CHRNA7CHRNB4CHRNA3CHRNA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 261 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119937243-A | Chemically amplified positive photosensitive resin composition, cured film, and element having cured film | 奇美实业股份有限公司 | 2025-05-06 | — | — | CN | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-116360211-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2023-06-30 | — | — | CN | disclosed |
| CN-111381438-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-06-20 | — | — | CN | disclosed |
| CN-115437214-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2022-12-06 | — | — | CN | disclosed |
| US-20220128906-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS OF TRIMMING PHOTORESIST PATTERNS | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC | 2022-04-28 | — | — | US | disclosed |
| CN-113126435-A | Chemically amplified positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2021-07-16 | — | — | CN | disclosed |
| CN-112394618-A | Chemically amplified positive photosensitive resin composition, and protective film and member produced therefrom | 奇美实业股份有限公司 | 2021-02-23 | — | — | CN | disclosed |
| CN-111999980-A | Chemically amplified positive photosensitive resin composition, protective film and module | 奇美实业股份有限公司 | 2020-11-27 | — | — | CN | disclosed |
| US-10795258-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-10-06 | — | — | US | disclosed |
| US-6284863-B1 | REACTED WITH UNSATURATED AMIDES THAT MAY BE CYCLIC, E.G., N-VINYL-2-PYRROLIDONE | SUMITOMO CHEMICAL COMPANY, LTD. (JP) | 2001-09-04 | — | — | US | disclosed |
| EP-1113005-A1 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2001-07-04 | — | — | EP | disclosed |
| EP-1059314-A1 | A resist composition | Wako Pure Chemical Industries, Ltd. (JP) | 2000-12-13 | — | — | EP | disclosed |
| EP-1024406-A1 | Resist composition | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 2000-08-02 | — | — | EP | disclosed |
| US-5891603-A | N-HYDROCARBYLSULFONYLOXY-SUBSTITUTED CYCLIC IMIDE SULFONIC ACID GENERATORS, POLYVINYLPHENOL DERIVATIVES | FUJI PHOTO FILM CO., LTD. (JP) | 1999-04-06 | — | — | US | disclosed |
| EP-0520642-B1 | Resist material and pattern formation process | WAKO PURE CHEM IND LTD (JP) | 1998-10-28 | — | — | EP | disclosed |
| EP-0803775-A1 | Positive working photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1997-10-29 | — | — | EP | disclosed |
| US-5670299-A | COATING A PHOTORESISTS POLYMER ON A SUBSTRATE, DEVELOPMENT AND HEAT TREATMENT | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-09-23 | — | — | US | disclosed |
| US-5468589-A | Heat resistant, photosensitive patterns | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1995-11-21 | — | — | US | disclosed |
| EP-0520642-A1 | Resist material and pattern formation process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1992-12-30 | — | — | EP | disclosed |