⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL685290 | 0.84 | — | — | |
| SCHEMBL12445294 | 0.81 | ALDH1A1 (0.46) | — | |
| SCHEMBL333504 | 0.81 | — | — | |
| SCHEMBL6876173 | 0.81 | ALDH1A1 (0.46) | — | |
| SCHEMBL610055 | 0.81 | ALDH1A1 (0.41) | — | |
| SCHEMBL14577290 | 0.80 | ALDH1A1 (0.40) | — | |
| SCHEMBL686165 | 0.80 | ALDH1A1 (0.40) | — | |
| SCHEMBL28705646 | 0.80 | — | — | |
| SCHEMBL16213957 | 0.80 | ALDH1A1 (0.40) | — | |
| SCHEMBL28705644 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121394516-B | Secondary battery and electronic device | 宁德新能源科技有限公司 | 2026-05-12 | — | — | CN | disclosed |
| CN-121097214-B | Secondary battery and electrochemical device | 宁德新能源科技有限公司 | 2026-05-12 | — | — | CN | disclosed |
| WO-2025131951-A1 | LITHIUM SECONDARY BATTERY WITH HIGH ENERGY DENSITY AND SAFETY | SOLVAY SPECIALTY POLYMERS ITALY S.P.A. (IT) | 2025-06-26 | — | — | WO | disclosed |
| WO-2025093455-A1 | LITHIUM SECONDARY BATTERY WITH ENHANCED ENERGY DENSITY | SPECIALTY OPERATIONS FRANCE (FR) | 2025-05-08 | — | — | WO | disclosed |
| US-20230161243-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20220171286-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2022-06-02 | — | — | US | disclosed |
| US-9778567-B2 | Resist composition, method of forming resist pattern, polymeric compound, compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-03 | — | — | US | disclosed |
| US-9771346-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-09-26 | — | — | US | disclosed |
| US-9766541-B2 | Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-09-19 | — | — | US | disclosed |
| US-20170066853-A1 | FLUORO-ALCOHOL ADDITIVES FOR ORIENTATION CONTROL OF BLOCK COPOLYMERS | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2017-03-09 | — | — | US | disclosed |
| US-20110319652-A1 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110200935-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110189607-A1 | NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-04 | — | — | US | disclosed |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110123926-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-05-26 | — | — | US | disclosed |
| US-20110076617-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110034721-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-10 | — | — | US | disclosed |
| US-20110015431-A1 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |