Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1521232 | 1.00 | TSHR (0.38) | TSHRALDH1A1SLC7A5TP53CYP2D6 | |
| SCHEMBL37014 | 0.91 | ALDH1A1 (0.32) | TSHRALDH1A1 | |
| SCHEMBL37013 | 0.91 | ALDH1A1 (0.32) | TSHRALDH1A1 | |
| SCHEMBL5332294 | 0.80 | — | — | |
| SCHEMBL29078866 | 0.79 | ALDH1A1 (0.35) | TSHRALDH1A1 | |
| SCHEMBL8140495 | 0.77 | GABRR1 (0.32) | CYP1A2 | |
| SCHEMBL811984 | 0.76 | — | — | |
| SCHEMBL1521400 | 0.76 | SLC7A5 (0.31) | SLC7A5 | |
| SCHEMBL2106039 | 0.75 | ALDH1A1 (0.32) | TSHRALDH1A1 | |
| SCHEMBL7978365 | 0.75 | TSHR (0.33) | TSHRALDH1A1CYP2D6CYP2C19HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6800419-B2 | FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-20030203307-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |
| JP-2001335654-A | FOAMING AGENT FOR SILICONE, FOAMING SILICONE COMPOSITION, AND SILICONE FOAMING MATERIAL | OTSUKA CHEM CO LTD | 2001-12-04 | — | — | JP | disclosed |