SCHEMBL6863412

SCHEMBL6863412

CCCCCCCCCCCC(C(O)C(O)CO)C(O)C(O)CO

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.53
CYP2D6 P10635 2/20 0.53
SPHK1 Q9NYA1 2/20 0.53
GMNN O75496 1/20 0.53
POLB P06746 1/20 0.53
THPO P40225 1/20 0.53
MTOR P42345 1/20 0.53
BLM P54132 1/20 0.53
KDM4E B2RXH2 1/20 0.53
TP53 P04637 1/20 0.53
CYP1A2 P05177 1/20 0.53
CYP3A4 P08684 1/20 0.53
MAPT P10636 1/20 0.53
CETP P11597 1/20 0.53
HTT P42858 1/20 0.53
UBE2N P61088 1/20 0.53
PSMD14 O00487 2/20 0.46
PLA2G1B P04054 2/20 0.46
MMP2 P08253 2/20 0.46
ATG4B Q9Y4P1 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7565882 0.90 LMNA (0.48) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL1262338 0.88 CYP2D6 (0.61) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL2232625 0.88 LMNA (0.47) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL1262826 0.88 CYP2D6 (0.61) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL2153227 0.84 LMNA (0.61) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL2992148 0.84 LMNA (0.61) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL28128055 0.84 LMNA (0.61) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL3194521 0.84 LMNA (0.61) LMNACYP2D6SPHK1GMNNPOLB
SCHEMBL4712787 0.84 LMNA (0.44) LMNACYP2D6SPHK1GMNNPOLB
Mannitol SCHEMBL27689597 0.84 LMNA (0.61) LMNACYP2D6SPHK1GMNNPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6800720-B2 BASE POLYMER CONTAINING AN ESTER GROUP TO BE DECOMPOSED TO A CARBOXYLIC ACID TO BECOME SOLUBLE IN THE DEVELOPER FOR A PHOTORESIST USED IN FINE WORKING OF A SEMICONDUCTOR USING ULTRAVIOLET RAY; HEAT RESISTANCE; OPTICS; ADHESION MITSUI CHEMICALS, INC. (JP) 2004-10-05 US disclosed
US-20020165328-A1 Hydrogenated ring-opening metathesis copolymer and process for producing the same MITSUI CHEMICALS, INC. (JP) 2002-11-07 US disclosed