SCHEMBL6863517

SCHEMBL6863517

Cc1ccc(NNc2cccc(C)c2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 3/20 0.57
MAPT P10636 3/20 0.54
CYP1A2 P05177 3/20 0.54
CYP3A4 P08684 2/20 0.54
CYP2D6 P10635 2/20 0.54
CYP2C19 P33261 2/20 0.54
NPSR1 Q6W5P4 2/20 0.54
CYP2C9 P11712 1/20 0.54
HTT P42858 1/20 0.54
ALDH1A1 P00352 1/20 0.53
HSD17B10 Q99714 1/20 0.48
HPGD P15428 1/20 0.48
ACHE P22303 1/20 0.48
MEN1 O00255 3/20 0.47
KMT2A Q03164 3/20 0.47
IDO1 P14902 2/20 0.46
NPC1 O15118 1/20 0.45
RAB9A P51151 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
RXFP1 Q9HBX9 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6694995 0.91 GAA (0.65) GAAMAPTCYP1A2CYP3A4CYP2D6
SCHEMBL28895568 0.88 NPSR1 (0.68) GAAMAPTCYP1A2CYP3A4CYP2D6
SCHEMBL16213169 0.83 RAPGEF4 (0.48) GAAMAPTCYP1A2CYP3A4CYP2D6
SCHEMBL11502241 0.82 NPSR1 (0.79) GAAMAPTCYP1A2CYP3A4CYP2D6
SCHEMBL3040701 0.82 NPSR1 (0.79) GAAMAPTCYP1A2CYP3A4CYP2D6
SCHEMBL21465958 0.80 HPGD (0.71) GAAMAPTCYP1A2CYP3A4CYP2D6
SCHEMBL2683360 0.80 TDP1 (0.57) GAAMAPTCYP1A2CYP3A4CYP2D6
SCHEMBL2479722 0.79 GAA (0.60) GAAMAPTCYP1A2CYP3A4CYP2D6
Hydrochloric Acid SCHEMBL29106619 0.78 HPGD (0.68) GAAMAPTCYP1A2CYP3A4CYP2D6
SCHEMBL8322258 0.77 GAA (0.57) GAAMAPTCYP1A2CYP3A4CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6797453-B2 WHICH HAS RESOLUTION HIGH ENOUGH TO FORM THROUGH HOLE OR U-SHAPED DEPRESSION; COMPRISES SILANE COUPLING AGENT; FOR ELECTROLUMINESCENT LIQUID CRYSTAL DISPLAYS JSR CORPORATION (JP) 2004-09-28 US disclosed
US-20030215737-A1 Radiation sensitive composition for forming an insulating film, insulating film and display device JSR CORPORATION (JP) 2003-11-20 US disclosed
EP-1331518-A2 Radiation sensitive composition for forming an insulating film, insulating film and display device JSR Corporation (JP) 2003-07-30 EP disclosed
EP-0304239-B1 Reformed polysilazane and method of producing same TOA NENRYO KOGYO KK (JP) 1995-04-19 EP disclosed
US-4975512-A Crosslinking with amine, ammonium, hydrazine PETROLEUM ENERGY CENTER (JP) 1990-12-04 US disclosed