SCHEMBL6863667

SCHEMBL6863667

CCC(C)=NO.C[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15254109 1.00 ALDH1A1 (0.50)
SCHEMBL65569 0.93
SCHEMBL160417 0.93
SCHEMBL65570 0.93
SCHEMBL11123616 0.93 ALDH1A1 (0.56)
SCHEMBL7827565 0.93
SCHEMBL11123615 0.93 ALDH1A1 (0.56)
SCHEMBL22028061 0.90 ALDH1A1 (0.47)
SCHEMBL27429223 0.90
Hydrochloric Acid SCHEMBL10780593 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6797444-B2 A PROTECTIVE LAYER CONTAINING A COUPLING FLUOROPOLYMER PARTICLES DISPERSED IN A COPOLYMER HAVING A FLUORINE ATOM-CONTAINING SILOXANE ADDITION-CONDENSATION PRODUCT IN A SIDE CHAIN; NONABRASIVE, HARDENING KONICA CORPORATION (JP) 2004-09-28 US disclosed
CN-1125375-C Waterless lithographic plate TORAY INDUSTRIES (JP) 2003-10-22 CN disclosed
US-20030134209-A1 Electrophotographic photoreceptor and production method of the same KONICA CORPORATION (JP) 2003-07-17 US disclosed
US-6569586-B2 Comprises photosensitive layer and resin layer including organic polymer, siloxane component, and charge transfer component; durability KONICA CORPORATION (JP) 2003-05-27 US disclosed
US-20020076631-A1 Photoreceptor for forming electrostatic latent image KONICA CORPORATION (JP) 2002-06-20 US disclosed
CN-1115187-A Waterless lithographic plate TORAY INDUSTRIES (JP) 1996-01-17 CN disclosed