SCHEMBL6864009

SCHEMBL6864009

[CH2]CN(C)S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CA2 P00918 10/20 0.41
CA1 P00915 9/20 0.38
MMP1 P03956 9/20 0.38
MMP2 P08253 9/20 0.38
MMP9 P14780 9/20 0.38
MMP8 P22894 9/20 0.38
MMP13 P45452 9/20 0.38
F2 P00734 4/20 0.35
PRSS1 P07477 4/20 0.35
PRSS2 P07478 4/20 0.35
PRSS3 P35030 4/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6858456 1.00 CA2 (0.41) CA2CA1MMP1MMP2MMP9
SCHEMBL6858453 1.00 CA2 (0.41) CA2CA1MMP1MMP2MMP9
SCHEMBL7624695 1.00 CA2 (0.41) CA2CA1MMP1MMP2MMP9
SCHEMBL4936152 0.98 CA2 (0.38) CA2CA1MMP1MMP2MMP9
SCHEMBL18258960 0.83 CA2 (0.35) CA2CA1MMP1MMP2MMP9
SCHEMBL31026913 0.82 CA2 (0.42) CA2CA1MMP1MMP2MMP9
SCHEMBL14422905 0.80 CA2 (0.39) CA2CA1MMP1MMP2MMP9
SCHEMBL5143705 0.80 CA2 (0.43) CA2CA1MMP1MMP2MMP9
SCHEMBL7630351 0.78 CA2 (0.38) CA2CA1MMP1MMP2MMP9
SCHEMBL8859625 0.78 CA2 (0.40) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2002036859-A1 METHODS FOR INCREASING IONIC CONDUCTIVITY IN CARBON DIOXIDE AND MIXTURES NORTH CAROLINA STATE UNIVERSITY (US) 2002-05-10 WO claimed
WO-2023120731-A1 POLYELECTROLYTE MEMBRANE HAVING, AS BASE THEREFOR, POLYMER HAVING HIGH DENSITY OF ACIDIC FUNCTIONAL GROUPS 国立大学法人東海国立大学機構 2023-06-29 WO disclosed
CN-1668660-A Dyed fluoropolymers 3M INNOVATIVE PROPERTIES CO (US) 2005-09-14 CN disclosed
US-6797444-B2 A PROTECTIVE LAYER CONTAINING A COUPLING FLUOROPOLYMER PARTICLES DISPERSED IN A COPOLYMER HAVING A FLUORINE ATOM-CONTAINING SILOXANE ADDITION-CONDENSATION PRODUCT IN A SIDE CHAIN; NONABRASIVE, HARDENING KONICA CORPORATION (JP) 2004-09-28 US disclosed
US-20030134209-A1 Electrophotographic photoreceptor and production method of the same KONICA CORPORATION (JP) 2003-07-17 US disclosed
WO-2002036859-A1 METHODS FOR INCREASING IONIC CONDUCTIVITY IN CARBON DIOXIDE AND MIXTURES NORTH CAROLINA STATE UNIVERSITY (US) 2002-05-10 WO disclosed
US-6352758-B1 PATTERNED FILMS OR COATINGS THAT ARE CAPABLE OF BEING MADE IN A SINGLE COATING STEP FROM THE SAME COMPOSITION. 3M INNOVATIVE PROPERTIES COMPANY 2002-03-05 US disclosed
EP-0958068-A1 NOVEL CLEANING PROCESS USING CARBON DIOXIDE AS A SOLVENT AND EMPLOYING MOLECULARLY ENGINEERED SURFACTANTS THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) 1999-11-24 EP disclosed
EP-0770095-B1 SUPERATMOSPHERIC REACTION MINNESOTA MINING & MFG (US) 1999-11-24 EP disclosed
US-5780565-A ADDITION POLYMERIZATION PERFORMED IN SUPERCRITICAL FLUID THAT IS CARBON DIOXIDE, HYDROFLUOROCARBON, PERFLUOROCARBON OR MIXTURE THEREOF MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1998-07-14 US disclosed
WO-1996006118-A1 CATIONIC POLYMERIZATION IN CARBON DIOXIDE THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) 1996-02-29 WO disclosed
WO-1996001851-A1 SUPERATMOSPHERIC REACTION MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-01-25 WO disclosed
WO-1996001850-A1 SUPERATMOSPHERIC REACTION MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-01-25 WO disclosed
EP-0248421-B1 Carrier for developer FUJI XEROX CO LTD (JP) 1994-09-07 EP disclosed
US-5110703-A Particles of magnetic powder in binder resin blend of polyolefin and olefin polymer having functional group FUJI XEROX CO., LTD. (JP) 1992-05-05 US disclosed
US-4965160-A CHARGE QUALITY FUJI XEROX CO., LTD. (JP) 1990-10-23 US disclosed
US-4954409-A FLUORINATED ACRYLIC POLYMER FUJI XEROX CO., LTD. (JP) 1990-09-04 US disclosed
US-4868083-A Developer carrier and process for producing the same FUJI XEROX CO., LTD. (JP) 1989-09-19 US disclosed
US-4791041-A FLUORINATED ALKYL (METH)ARYLATE COPOLYMER OVERCOATINGS; ANTISOILANTS; ANTISTICKING AGENTS FUJI XEROX CO., LTD. (JP) 1988-12-13 US disclosed
EP-0248421-A2 Carrier for developer FUJI XEROX CO., LTD. (JP) 1987-12-09 EP disclosed