⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL48511 | 0.83 | ELANE (0.37) | — | |
| SCHEMBL24858793 | 0.81 | SMN1; SMN2 (0.36) | — | |
| SCHEMBL29045333 | 0.80 | ELANE (0.36) | — | |
| SCHEMBL24240716 | 0.79 | — | — | |
| Bicarbonate SCHEMBL29098229 | 0.78 | TP53 (0.37) | — | |
| SCHEMBL4410781 | 0.77 | — | — | |
| Benzene SCHEMBL9407335 | 0.75 | ELANE (0.42) | — | |
| SCHEMBL1081596 | 0.75 | — | — | |
| SCHEMBL24725871 | 0.75 | TP53 (0.36) | — | |
| SCHEMBL3803538 | 0.75 | SMN1; SMN2 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 788 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119060547-A | Special fluorosilicone rubber and preparation process thereof | 浙江圆通新材料有限公司 | 2024-12-03 | — | — | CN | claimed |
| US-10663863-B2 | Method of producing layer structure, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2020-05-26 | — | — | US | claimed |
| CN-105575775-B | Layer structure and the method and semiconductor device for manufacturing its method, forming pattern | 三星SDI株式会社 | 2019-08-13 | — | — | CN | claimed |
| US-10312074-B2 | Method of producing layer structure, layer structure, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2019-06-04 | — | — | US | claimed |
| CN-109678711-A | System and method for extracting methyl methoxypropionate from methyl acrylate waste oil | 山东开泰石化股份有限公司 | 2019-04-26 | — | — | CN | claimed |
| CN-109661615-A | Solution, solution host body, sensitized ray or radiation-sensitive resin composition, pattern forming method, the manufacturing method of semiconductor device | 富士胶片株式会社 | 2019-04-19 | — | — | CN | claimed |
| CN-109628042-A | A kind of photo-crosslinking adhesive | 深圳日高胶带新材料有限公司 | 2019-04-16 | — | — | CN | claimed |
| CN-109096889-A | A kind of kirsite device water high light high temperature baking vanish | 惠州市长冠涂料有限公司 | 2018-12-28 | — | — | CN | claimed |
| CN-106164140-B | The oil-based solvent dispersoid of polytetrafluoroethylene (PTFE) | 三菱铅笔株式会社 | 2018-12-25 | — | — | CN | claimed |
| CN-108473682-A | Polysilsesquioxane resin composition for flexible substrate | LTC有限公司 | 2018-08-31 | — | — | CN | claimed |
| CN-103336412-B | Novel photoresist stripping liquid and application process thereof | 北京科华微电子材料有限公司 | 2017-02-08 | — | — | CN | claimed |
| CN-104039696-B | The large-area graphene three-dimensional transparent electrode manufacturing method utilizing electron spray operation and the large-area graphene three-dimensional transparent electrode thus manufactured | KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) | 2016-11-30 | — | — | CN | claimed |
| CN-106164140-A | The oil-based solvent dispersoid of politef | 三菱铅笔株式会社 | 2016-11-23 | — | — | CN | claimed |
| CN-105867070-A | Thinner composition | 东友精细化工有限公司 | 2016-08-17 | — | — | CN | claimed |
| CN-105575775-A | Method of producing layer structure, layer structure, a method of forming patterns and a semiconductor device | SAMSUNG SDI CO LTD | 2016-05-11 | — | — | CN | claimed |
| US-20160126088-A1 | METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2016-05-05 | — | — | US | claimed |
| CN-103324030-B | Positive photoresist composition and positive photoresist developing process | KEMPUR MICROELECTRONICS, INC. (CN) | 2015-09-09 | — | — | CN | claimed |
| CN-102768467-B | Sensitizer for chemical amplification type positive photoresist and application thereof | CHINESE ACAD TECH INST PHYSICS | 2014-11-05 | — | — | CN | claimed |
| CN-104039696-A | Method for manufacturing large-scale three-dimensional transparent graphene electrodes by electrospraying, and large-scale three-dimensional transparent graphene electrode manufactured by using the method | KOREA IND TECH INST | 2014-09-10 | — | — | CN | claimed |
| CN-102272186-B | (poly)carbonate polyol and carboxyl group-containing polyurethane using the (poly)carbonate polyol as starting material | SHOWA DENKO KK | 2013-06-05 | — | — | CN | claimed |