⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Perchlorate SCHEMBL270105 | 0.91 | — | — | |
| Perchlorate SCHEMBL29423290 | 0.91 | — | — | |
| Perchlorate SCHEMBL1826486 | 0.83 | — | — | |
| Perchlorate SCHEMBL30510671 | 0.83 | — | — | |
| Perchlorate SCHEMBL6868773 | 0.83 | — | — | |
| Perchlorate SCHEMBL6232126 | 0.83 | — | — | |
| Perchlorate SCHEMBL10618973 | 0.77 | — | — | |
| Perchlorate SCHEMBL4344944 | 0.73 | — | — | |
| Perchlorate SCHEMBL1122987 | 0.73 | — | — | |
| Perchlorate SCHEMBL11490710 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107561863-B | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2022-09-16 | — | — | CN | disclosed |
| US-20180356725-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2018-12-13 | — | — | US | disclosed |
| US-6815142-B1 | Method for forming resist pattern, and overlying layer material and semiconductor device used for forming resist pattern | RENESAS TECHNOLOGY CORP. (JP) | 2004-11-09 | — | — | US | disclosed |