SCHEMBL686942

SCHEMBL686942

[Cr].[SiH3][Ni]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27937745 0.89
SCHEMBL27719899 0.89
SCHEMBL28392106 0.89
SCHEMBL10794506 0.89
SCHEMBL25074 0.87
Methane SCHEMBL27929718 0.82
SCHEMBL2236941 0.82
SCHEMBL28665956 0.82
SCHEMBL28473721 0.82
SCHEMBL7699346 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6793781-B2 Cathode targets of silicon and transition metal PPG INDUSTRIES OHIO, INC. 2004-09-21 US claimed
US-20020125130-A1 Cathode targets of silicon and transition metal VITRO FLAT GLASS LLC 2002-09-12 US claimed
US-6365014-B2 Cathode targets of silicon and transition metal PPG INDUSTRIES OHIO, INC. 2002-04-02 US claimed
US-20010008206-A1 CATHODE TARGETS OF SILICON AND TRANSITION METAL VITRO FLAT GLASS LLC 2001-07-19 US claimed
US-5709938-A Cathode targets of silicon and transition metal PPG INDUSTRIES, INC. (US) 1998-01-20 US claimed
CN-222320271-U Integrated chip 台湾积体电路制造股份有限公司 2025-01-07 CN disclosed
US-20240371917-A1 RESISTOR STRUCTURE HAVING CAVITIES FOR INCREASED RESISTOR PERFORMANCE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2024-11-07 US disclosed
EP-1194385-B9 PROTECTIVE LAYERS FOR SPUTTER COATED ARTICLE PPG IND OHIO INC (US) 2012-02-29 EP disclosed
EP-1194385-B1 PROTECTIVE LAYERS FOR SPUTTER COATED ARTICLE PPG IND OHIO INC (US) 2011-10-05 EP disclosed
US-7413768-B2 Protective layers for sputter coated article and method for making sputter coated articles PPG INDUSTRIES OHIO, INC. (US) 2008-08-19 US disclosed
US-20050129863-A1 Protective layers for sputter coated article and method for making sputter coated articles VITRO FLAT GLASS LLC 2005-06-16 US disclosed
US-6833194-B1 Zinc stannate dielectric film; infrared reflective layer; metal primer and protective coating; chemical resistance, durability,transmittance, low emissivity PPG INDUSTRIES OHIO, INC. 2004-12-21 US disclosed
WO-2000076930-A1 PROTECTIVE LAYERS FOR SPUTTER COATED ARTICLE PPG INDUSTRIES OHIO, INC. (US) 2000-12-21 WO disclosed
US-5709938-A Cathode targets of silicon and transition metal PPG INDUSTRIES, INC. (US) 1998-01-20 US disclosed
US-5709938-A Cathode targets of silicon and transition metal PPG INDUSTRIES, INC. (US) 1998-01-20 US disclosed
EP-0013507-B2 HIGH SILICON CHROMIUM NICKEL STEEL AND A METHOD OF USING IT TO INHIBIT CORROSION OF APPARATUS BY STRONG NITRIC ACID SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1989-03-08 EP disclosed
EP-0013507-B2 HIGH SILICON CHROMIUM NICKEL STEEL AND A METHOD OF USING IT TO INHIBIT CORROSION OF APPARATUS BY STRONG NITRIC ACID SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1989-03-08 EP disclosed
EP-0013507-B1 HIGH SILICON CHROMIUM NICKEL STEEL AND A METHOD OF USING IT TO INHIBIT CORROSION OF APPARATUS BY STRONG NITRIC ACID SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1983-04-13 EP disclosed
US-4279648-A High silicon chromium nickel steel for strong nitric acid SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1981-07-21 US disclosed
EP-0013507-A1 High silicon chromium nickel steel and a method of using it to inhibit corrosion of apparatus by strong nitric acid SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1980-07-23 EP disclosed