SCHEMBL6870531

SCHEMBL6870531

C=CCOC(=O)c1ccccc1C(Cl)(Cl)Cl

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.70
TSHR P16473 4/20 0.60
ALDH1A1 P00352 4/20 0.60
HSD17B10 Q99714 1/20 0.60
NPC1 O15118 1/20 0.44
RHOA P61586 1/20 0.43
LIG1 P18858 1/20 0.40
NPSR1 Q6W5P4 1/20 0.39
CYP1A2 P05177 1/20 0.39
HPGD P15428 1/20 0.39
MEN1 O00255 3/20 0.39
KMT2A Q03164 3/20 0.39
MAPT P10636 2/20 0.39
KDM4E B2RXH2 1/20 0.39
LMNA P02545 1/20 0.39
GAA P10253 1/20 0.39
MAPK1 P28482 1/20 0.39
PKM P14618 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
SNCA P37840 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6870550 0.86 CYP3A4 (0.72) CYP3A4TSHRALDH1A1HSD17B10NPC1
SCHEMBL14780445 0.85 ALDH1A1 (0.58) CYP3A4TSHRALDH1A1HSD17B10NPC1
SCHEMBL14780479 0.84 CYP3A4 (0.70) CYP3A4TSHRALDH1A1HSD17B10NPC1
SCHEMBL15174 0.83 CYP3A4 (1.00) CYP3A4TSHRALDH1A1HSD17B10NPC1
SCHEMBL16371573 0.83 CYP3A4 (1.00) CYP3A4TSHRALDH1A1HSD17B10NPC1
SCHEMBL29362146 0.83 CYP3A4 (1.00) CYP3A4TSHRALDH1A1HSD17B10NPC1
SCHEMBL27474785 0.83 CYP3A4 (1.00) CYP3A4TSHRALDH1A1HSD17B10NPC1
SCHEMBL4431185 0.82 CYP3A4 (0.77) CYP3A4TSHRALDH1A1HSD17B10NPC1
SCHEMBL29078177 0.82 CYP3A4 (0.66) CYP3A4TSHRALDH1A1HSD17B10NPC1
Vinyl Chloride SCHEMBL8855429 0.82 CYP3A4 (0.89) CYP3A4TSHRALDH1A1HSD17B10NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1209528-B1 Photoresist composition ETERNAL TECHNOLOGY CORP (US) 2015-07-22 EP claimed
US-6818375-B2 FOR MANUFACTURING PRINTED WIRING BOARDS ETERNAL TECHNOLOGY CORPORATION 2004-11-16 US claimed
US-20020132180-A1 Photoresist composition SHIPLEY COMPANY, L.L.C. (US) 2002-09-19 US claimed
EP-1209528-A1 Photoresist composition Shipley Co. L.L.C. (US) 2002-05-29 EP claimed
EP-1209528-B1 Photoresist composition ETERNAL TECHNOLOGY CORP (US) 2015-07-22 EP disclosed
US-9040268-B2 Method for controlling undesirable byproducts formation caused by contaminating organisms in the production of ethanol from syngas COSKATA, INC. (US) 2015-05-26 US disclosed
EP-2758540-A1 METHOD FOR CONTROLLING UNDESIRABLE BYPRODUCTS FORMATION CAUSED BY CONTAMINATING ORGANISMS IN THE PRODUCTION OF ETHANOL FROM SYNGAS Coskata Energy Inc. (US) 2014-07-30 EP disclosed
WO-2013043513-A1 METHOD FOR CONTROLLING UNDESIRABLE BYPRODUCTS FORMATION CAUSED BY CONTAMINATING ORGANISMS IN THE PRODUCTION OF ETHANOL FROM SYNGAS COSKATA, INC. (US) 2013-03-28 WO disclosed
US-20130071897-A1 METHOD FOR CONTROLLING UNDESIRABLE BYPRODUCTS FORMATION CAUSED BY CONTAMINATING ORGANISMS IN THE PRODUCTION OF ETHANOL FROM SYNGAS COSKATA, INC. (US) 2013-03-21 US disclosed
US-6818375-B2 FOR MANUFACTURING PRINTED WIRING BOARDS ETERNAL TECHNOLOGY CORPORATION 2004-11-16 US disclosed
US-20020132180-A1 Photoresist composition SHIPLEY COMPANY, L.L.C. (US) 2002-09-19 US disclosed
EP-1209528-A1 Photoresist composition Shipley Co. L.L.C. (US) 2002-05-29 EP disclosed