SCHEMBL688806

SCHEMBL688806

Nc1cc(O)cc2ccccc12

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NQO2 P16083 1/20 0.61
ALDH1A1 P00352 3/20 0.53
HPGD P15428 2/20 0.53
KDM4E B2RXH2 2/20 0.53
MEN1 O00255 1/20 0.53
MAPT P10636 1/20 0.53
MPI P34949 1/20 0.53
KMT2A Q03164 1/20 0.53
HSD17B10 Q99714 2/20 0.50
CYP3A4 P08684 1/20 0.50
TSHR P16473 1/20 0.50
KEAP1 Q14145 1/20 0.50
HPRT1 P00492 1/20 0.47
TRPM4 Q8TD43 1/20 0.46
PKM P14618 1/20 0.45
CDC25B P30305 2/20 0.44
CYP1A2 P05177 2/20 0.44
HDAC3 O15379 1/20 0.41
IDO1 P14902 1/20 0.41
EP300 Q09472 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2763409 0.83 NQO2 (0.47) NQO2ALDH1A1HPGDKDM4EMEN1
SCHEMBL29351048 0.76 NQO2 (1.00) NQO2ALDH1A1HPGDKDM4EMEN1
SCHEMBL2153752 0.76 ALDH1A1 (0.54) NQO2ALDH1A1HPGDKDM4EKMT2A
SCHEMBL29487594 0.76 ALDH1A1 (0.54) NQO2ALDH1A1HPGDKDM4EKMT2A
SCHEMBL28681 0.76 NQO2 (1.00) NQO2ALDH1A1HPGDKDM4EMEN1
SCHEMBL31001020 0.76 ALDH1A1 (0.76) NQO2ALDH1A1HPGDKDM4EMEN1
SCHEMBL9052405 0.76 ALDH1A1 (0.76) NQO2ALDH1A1HPGDKDM4EMEN1
SCHEMBL5147716 0.76 NQO2 (1.00) NQO2ALDH1A1HPGDKDM4EMEN1
SCHEMBL8006496 0.76 ALDH1A1 (0.54) NQO2ALDH1A1HPGDKDM4EMEN1
SCHEMBL117031 0.76 ALDH1A1 (0.54) NQO2ALDH1A1HPGDKDM4EMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 294 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119978351-A Amino-terminated oligomeric polyaryletherketone compatilizer, and preparation method and application thereof 江苏君华特种高分子材料股份有限公司 2025-05-13 CN claimed
CN-119781246-A Photosensitive polyimide resin composition, cured film, and preparation method and application thereof 吉林奥来德光电材料股份有限公司 2025-04-08 CN claimed
CN-115010924-B Photosensitive polyimide resin composition, polyimide resin film containing photosensitive polyimide resin composition and application of photosensitive polyimide resin composition 吉林奥来德光电材料股份有限公司 2023-10-13 CN claimed
CN-115010924-A Photosensitive polyimide resin composition, polyimide resin film containing same and application of polyimide resin film 吉林奥来德光电材料股份有限公司 2022-09-06 CN claimed
EP-1630605-B1 PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES (JP) 2017-10-11 EP claimed
US-20090240033-A1 AFFINITY MATRIX LIBRARY AND ITS USE LI RONGXIU 2009-09-24 US claimed
US-7481522-B2 Compositions and inks containing disazo dyes FUJIFILM IMAGING COLORANTS LIMITED (GB) 2009-01-27 US claimed
EP-0927153-A1 METHOD FOR THE CARBOXYLATION ON AN AMINONAPHTOL RHODIA CHIMIE (FR) 1999-07-07 EP claimed
WO-1998011055-A1 METHOD FOR THE CARBOXYLATION ON AN AMINONAPHTOL RHODIA CHIMIE (FR) 1998-03-19 WO claimed
US-5043083-A Reacting with primary or secondary amine EXXON CHEMICAL PATENTS, INC. (US) 1991-08-27 US claimed
EP-0382449-A2 Method for preparing salts of polyolefinic substituted dicarboxylic acids in oleaginous mixtures of reduced viscosity EXXON CHEMICAL PATENTS INC. (US) 1990-08-16 EP claimed
US-20260104641-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-16 US disclosed
US-12583973-B2 Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-03-24 US disclosed
EP-4660704-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT Shin-Etsu Chemical Co., Ltd. (JP) 2025-12-10 EP disclosed
US-20250355350-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-11-20 US disclosed
US-4820432-A FROM LACTONE, AMINE, ALDEHYDE, HYDROXYARYLAMINE, AND HYDROCARBYL SUBSTITUTED UNSATURATED DICARBOXYLIC ACID EXXON CHEMICAL PATENTS INC. (US) 1989-04-11 US disclosed
EP-0302643-A1 Lactone-modified mannich base dispersant additives useful in oleaginous compositions EXXON CHEMICAL PATENTS INC. (US) 1989-02-08 EP disclosed
EP-0255643-A2 Metal complex compound useful as a near infrared absorber HODOGAYA CHEMICAL CO., LTD. (JP) 1988-02-10 EP disclosed
US-4394070-A Helichromic compounds and displays MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1983-07-19 US disclosed
US-4139530-A CATIONIC DYES BAYER AKTIENGESELLSCHAFT (DE) 1979-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260104641-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT ARCN1, PRDM9, LBR NQO2 1310/4885ALDH1A1 3706/4885HPGD 3438/4885
US-12583973-B2 Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component PRDM9, ARCN1, PUF60 NQO2 4690/4885ALDH1A1 3281/4885HPGD 4313/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.