SCHEMBL6903070

SCHEMBL6903070

CC(C)(C)c1ccc2c(c1)C([Zr](C1=C(c3ccccc3)C(c3ccccc3)=C(c3ccccc3)C1c1ccccc1)=C(c1ccccc1)c1ccccc1)c1cc(C(C)(C)C)ccc1-2

nearest known ligand 0.30

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.30
TNF P01375 1/20 0.30
KLF5 Q13887 1/20 0.30
NOD1 Q9Y239 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL19056260 0.99
SCHEMBL6899875 0.84
SCHEMBL6905667 0.82 CYP19A1 (0.30) CYP19A1TNFKLF5NOD1
SCHEMBL6905446 0.81
SCHEMBL6903094 0.78
SCHEMBL6904942 0.75 ESR1 (0.32)
SCHEMBL6905960 0.73 LMNA (0.32) TNFKLF5NOD1
Hydrochloric Acid SCHEMBL454881 0.73
SCHEMBL6904061 0.72 NPC1 (0.33) CYP19A1TNFKLF5NOD1
Hydrochloric Acid SCHEMBL19056261 0.72 LMNA (0.31) TNFKLF5NOD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1473323-A1 Polyethylene composition and process for producing same Tosoh Corporation (JP) 2004-11-03 EP disclosed