SCHEMBL6903315

SCHEMBL6903315

C=C(C)C(=O)Oc1ccc(F)cc1

nearest known ligand 0.59

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.59
KMT2A Q03164 4/20 0.54
ATM Q13315 2/20 0.54
MAOB P27338 3/20 0.41
LMNA P02545 1/20 0.41
MAPT P10636 1/20 0.40
ALDH1A1 P00352 3/20 0.40
FAAH O00519 2/20 0.40
KDM4E B2RXH2 1/20 0.40
CYP1A2 P05177 1/20 0.40
HPGD P15428 1/20 0.40
RAB9A P51151 1/20 0.38
MAOA P21397 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL56436 0.89 ELANE (0.69) ELANEKMT2AATMLMNAMAPT
SCHEMBL16334971 0.83 ELANE (0.68) ELANEKMT2AATMLMNAMAPT
SCHEMBL803168 0.83 ELANE (0.62) ELANEKMT2AATMLMNAMAPT
SCHEMBL17433304 0.83 ELANE (0.62) ELANEKMT2AATMLMNAMAPT
SCHEMBL14173258 0.83 ELANE (0.62) ELANEKMT2AATMLMNAMAPT
SCHEMBL14173256 0.83 ELANE (0.62) ELANEKMT2AATMLMNAMAPT
SCHEMBL12872192 0.83 ELANE (0.62) ELANEKMT2AATMLMNAMAPT
SCHEMBL3871529 0.83 LMNA (0.43) ELANEKMT2AATMMAOBLMNA
SCHEMBL2604662 0.83 ELANE (0.50) ELANEKMT2AATMLMNAMAPT
Butane SCHEMBL15309676 0.82 ELANE (0.61) ELANEKMT2AATMLMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115322100-A Delta, epsilon-alkenyl ketone compound and preparation method and application thereof 南京工业大学 2022-11-11 CN claimed
WO-2022146115-A1 POLYMER COMPRISING PENTAFLUOROPHENYL ESTER AND ELECTROCHEMICAL BIOSENSOR COMPRISING SAME 주식회사 아이센스 2022-07-07 WO claimed
CN-113200856-A Trifluoromethyl propylene compound and preparation method and application thereof 南京工业大学 2021-08-03 CN claimed
CN-112047842-A 1, 4-diene compound and preparation method and application thereof 南京工业大学 2020-12-08 CN claimed
JP-57122430-A None JP disclosed
CN-117185965-A Preparation method of sulfonic acrylic acid salt compound surfactant 安徽金桐精细化学有限公司 2023-12-08 CN disclosed
US-11786160-B2 Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-17 US disclosed
US-11786160-B2 Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-17 US disclosed
CN-115850076-A Method for introducing difluoromethylene into allyl ester compound aromatic ring 南京工业大学 2023-03-28 CN disclosed
CN-115490592-A Method for constructing 1, 4-diene drug molecular skeleton 南京工业大学 2022-12-20 CN disclosed
CN-115322100-A Delta, epsilon-alkenyl ketone compound and preparation method and application thereof 南京工业大学 2022-11-11 CN disclosed
US-11357970-B2 Biomedical electrode composition, biomedical electrode and method for manufacturing the biomedical electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-14 US disclosed
US-5389708-A Polymerizing polyisocyanate or polyisothiocyanate with polyol or polythiol in presence of thiophosphoric or dithiophosphoric acid ester MITSUI TOATSU CHEMICALS, INC. (JP) 1995-02-14 US disclosed
EP-0553801-A1 Use of sulfur-containing acid phosphoric ester as internal release agent MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-08-04 EP disclosed
US-5155190-A Suspension polymerization, excellent heat resistance, weatherproofing and transparency HITACHI CHEMICAL COMPANY (JP) 1992-10-13 US disclosed
US-RE34061-E And one or more unsaturated monomes; transparency, heat and moisture resistance optical elements HITACHI CHEMICAL CO., LTD. (JP) 1992-09-08 US disclosed
EP-0488116-A2 Polymer dispersed liquid crystal display element and method of fabricating the same SEIKO EPSON CORPORATION (JP) 1992-06-03 EP disclosed
US-4591626-A TRANSPARENT OPTICAL MATERIALS HITACHI CHEMICAL COMPANY, LTD. (JP) 1986-05-27 US disclosed
EP-0141610-A2 Optical elements comprising polymers of (meth)acrylate esters Hitachi Chemical Co., Ltd. (JP) 1985-05-15 EP disclosed
JP-S57122430-A POSITIVE TYPE RESIST MATERIAL WITH DRY ETCHING RESISTANCE NIPPON TELEGR & TELEPH CORP <NTT> 1982-07-30 JP disclosed