SCHEMBL690677

SCHEMBL690677

CCC(C)=C(O)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19252586 0.79
SCHEMBL16519774 0.79
SCHEMBL28844232 0.79
SCHEMBL27824858 0.73
SCHEMBL14395906 0.73
SCHEMBL11789081 0.72
SCHEMBL11789088 0.72
SCHEMBL11654342 0.72
SCHEMBL7614582 0.69
SCHEMBL1287804 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6403063-B1 APPLYING POLYUREA; CURING SAWYER KENNETH I (US) 2002-06-11 US claimed
US-6401724-B1 POLYUREA-FORMING COMPOSITION SUCH AS 1)AN AMINOBENZOIC ACID ESTER OR AMIDE OF A POSSIBLY OLIGOMERIC POLYOL OR POLYAMINE OR AN AROMATIC DIAMINE AND 2)A POLYISOCYANATE PAR PHARMACEUTICALS INCORPORATED 2002-06-11 US claimed
US-9402860-B2 Methods of inhibiting the growth of onychomycosis and urushiol-induced allergic contact dermatitis CHESSON LABORATORY ASSOCIATES, INC. (US) 2016-08-02 US disclosed
EP-1962866-B1 Poly(urea-urethane) compositions useful as topical medicaments and methods of using the same ROOF MATRIX INC (US) 2015-03-18 EP disclosed
EP-1542842-B1 NON-TOXIC HYDROPHOBIC ELASTOMERIC POLYMER CHEMISTRY SYSTEM FOR WOOD PRESERVATION ROOF MATRIX INC (US) 2012-02-29 EP disclosed
US-20080253984-A1 METHODS OF INHIBITING THE GROWTH OF ONYCHOMYCOSIS AND URUSHIOL-INDUCED ALLERGIC CONTACT DERMATITIS NAIL GENESIS LLC 2008-10-16 US disclosed
EP-1962866-A2 HYDROPHOBIC ELASTOMERIC POLYMER CHEMISTRY DEVICE FOR INHIBITING THE GROWTH OF ONYCHOMYCOSIS AND URUSHIOL-INDUCED ALLERGIC CONTACT DERMATITIS Roof Matrix, Inc. (US) 2008-09-03 EP disclosed
WO-2007062381-A2 HYDROPHOBIC ELASTOMERIC POLYMER CHEMISTRY DEVICE FOR INHIBITING THE GROWTH OF ONYCHOMYCOSIS AND URUSHIOL-INDUCED ALLERGIC CONTACT DERMATITIS ROOF MATRIX, INC. (US) 2007-05-31 WO disclosed
US-20060216267-A1 Hydrophobic elastomeric polymer chemistry device for inhibiting the growth of onychomycosis and urushiol-induced allergic contact dermatitis ROOF MATRIX, INC. 2006-09-28 US disclosed
US-7008997-B2 Non-toxic hydrophobic elastomeric polymer chemistry system for wood preservation ROOF MATRIX, INC. (US) 2006-03-07 US disclosed
EP-1542842-A1 NON-TOXIC HYDROPHOBIC ELASTOMERIC POLYMER CHEMISTRY SYSTEM FOR WOOD PRESERVATION Roof Matrix, Inc. (US) 2005-06-22 EP disclosed
US-20040147649-A1 Non-toxic hydrophobic elastomeric polymer chemistry system for wood preservation EPI HEALTH, LLC 2004-07-29 US disclosed
WO-2004018171-A1 NON-TOXIC HYDROPHOBIC ELASTOMERIC POLYMER CHEMISTRY SYSTEM FOR WOOD PRESERVATION ROOF MATRIX, INC. (US) 2004-03-04 WO disclosed
US-6401724-B1 POLYUREA-FORMING COMPOSITION SUCH AS 1)AN AMINOBENZOIC ACID ESTER OR AMIDE OF A POSSIBLY OLIGOMERIC POLYOL OR POLYAMINE OR AN AROMATIC DIAMINE AND 2)A POLYISOCYANATE PAR PHARMACEUTICALS INCORPORATED 2002-06-11 US disclosed
US-6403063-B1 APPLYING POLYUREA; CURING SAWYER KENNETH I (US) 2002-06-11 US disclosed