Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | HMGCR | P04035 | 1/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.32 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.32 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | VDR | P11473 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | RCE1 | Q9Y256 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29401265 | 1.00 | KMT2A (0.37) | KMT2AHSD11B1NPC1RAB9AL3MBTL1 | |
| SCHEMBL93393 | 0.96 | KMT2A (0.39) | KMT2AHSD11B1NPC1RAB9AL3MBTL1 | |
| SCHEMBL4837194 | 0.96 | KMT2A (0.39) | KMT2AHSD11B1NPC1RAB9AL3MBTL1 | |
| SCHEMBL9565976 | 0.93 | KMT2A (0.37) | KMT2AHSD11B1NPC1RAB9AL3MBTL1 | |
| SCHEMBL21002308 | 0.93 | KMT2A (0.37) | KMT2AHSD11B1NPC1RAB9AL3MBTL1 | |
| SCHEMBL15788961 | 0.93 | NPC1 (0.37) | KMT2AHSD11B1NPC1RAB9AL3MBTL1 | |
| SCHEMBL15788938 | 0.93 | KMT2A (0.37) | KMT2AHSD11B1NPC1RAB9AL3MBTL1 | |
| SCHEMBL21405194 | 0.93 | KMT2A (0.37) | KMT2AHSD11B1NPC1RAB9AL3MBTL1 | |
| SCHEMBL9325238 | 0.93 | KMT2A (0.37) | KMT2AHSD11B1NPC1RAB9AL3MBTL1 | |
| SCHEMBL4778005 | 0.93 | KMT2A (0.37) | KMT2AHSD11B1NPC1RAB9AL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10428183-B2 | Room temperature-curable resin composition containing an aluminum chelate compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-01 | — | — | US | claimed |
| US-20190169373-A1 | ROOM TEMPERATURE-CURABLE RESIN COMPOSITION CONTAINING AN ALUMINUM CHELATE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-06-06 | — | — | US | claimed |
| CN-107406330-A | Production of core/shell structured composite spinel powders by flame pyrolysis | 阿纳多卢大学雷克多卢库 | 2017-11-28 | — | — | CN | claimed |
| EP-2998287-B1 | ALUMINIUM CHELATE COMPOUND, AND ROOM-TEMPERATURE-CURABLE RESIN COMPOSITION INCLUDING SAME | SHINETSU CHEMICAL CO (JP) | 2023-07-19 | — | — | EP | disclosed |
| EP-3135679-B1 | USE OF BIS (ALKOXYSILYL-VINYLENE) GROUP-CONTAINING SILICON COMPOUNDS AS A CURING AGENT FOR ROOM TEMPERATURE CURABLE ORGANOPOLYSILOXANE COMPOSITIONS | SHINETSU CHEMICAL CO (JP) | 2019-10-30 | — | — | EP | disclosed |
| US-10428183-B2 | Room temperature-curable resin composition containing an aluminum chelate compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-01 | — | — | US | disclosed |
| US-20190169373-A1 | ROOM TEMPERATURE-CURABLE RESIN COMPOSITION CONTAINING AN ALUMINUM CHELATE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-06-06 | — | — | US | disclosed |
| US-10005799-B2 | Bis (alkoxysilyl-vinylene) group-containing silicon compound and production method of same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| CN-105449228-B | Manufacture method, electrode catalyst for fuel cell and its purposes of electrode catalyst for fuel cell | 昭和电工株式会社 | 2018-02-16 | — | — | CN | disclosed |
| US-20180037596-A1 | NOVEL BIS (ALKOXYSILYL-VINYLENE) GROUP-CONTAINING SILICON COMPOUND AND PRODUCTION METHOD OF SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-08 | — | — | US | disclosed |
| EP-3135679-A1 | NOVEL BIS (ALKOXYSILYL-VINYLENE) GROUP-CONTAINING SILICON COMPOUND AND MANUFACTURING METHOD THEREFOR | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-03-01 | — | — | EP | disclosed |
| CN-1165942-C | Plasma display board suitable for display device and manufacture mehtod thereof | ���µ�����ҵ��ʽ���� | 2004-09-08 | — | — | CN | disclosed |
| US-6761608-B2 | Plasma display panel suitable for high-quality display and production method | MATSUSHITA ELECTRIC INDUSTRIAL CO. LTD. (JP) | 2004-07-13 | — | — | US | disclosed |
| CN-1104022-C | Plasma display panel suitable for display and its manufacturing method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2003-03-26 | — | — | CN | disclosed |
| CN-1362721-A | Plasmd display board suitable for display devie and manufacture method thereof | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2002-08-07 | — | — | CN | disclosed |
| US-6419540-B1 | VAPOR DEPOSITION OF INORGANIC REACTION PRODUCT OF METAL OXIDES OVER SILVER ELECTRODE | MASTUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2002-07-16 | — | — | US | disclosed |
| US-20020036466-A1 | Plasma display panel suitable for high-quality display and production method | TANAKA HIROYOSHI (JP) | 2002-03-28 | — | — | US | disclosed |
| US-20020034917-A1 | Plasma display panel suitable for high-quality display and production method | TANAKA HIROYOSHI (JP) | 2002-03-21 | — | — | US | disclosed |
| US-6160345-A | Plasma display panel with metal oxide layer on electrode | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2000-12-12 | — | — | US | disclosed |
| CN-1200554-A | Plasma display panel suitable for high quality display and method of manufacturing the same | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 1998-12-02 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180037596-A1 | NOVEL BIS (ALKOXYSILYL-VINYLENE) GROUP-CONTAINING SILICON COMPOUND AND PRODUCTION METHOD OF SAME | CMA1, SEM1, HBS1L | KMT2A 1519/4885HSD11B1 2343/4885NPC1 4126/4885 |
| US-10005799-B2 | Bis (alkoxysilyl-vinylene) group-containing silicon compound and production method of same | CMA1, SEM1, HBS1L | KMT2A 1277/4885HSD11B1 2278/4885NPC1 4190/4885 |
| US-10428183-B2 | Room temperature-curable resin composition containing an aluminum chelate compound | PSMB8, CHD8, ASH2L | KMT2A 465/4885HSD11B1 4181/4885NPC1 4353/4885 |
| US-20190169373-A1 | ROOM TEMPERATURE-CURABLE RESIN COMPOSITION CONTAINING AN ALUMINUM CHELATE COMPOUND | PSMB8, CHD8, ASH2L | KMT2A 465/4885HSD11B1 4181/4885NPC1 4353/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.