Zinc Ion

Zinc Ion

SCHEMBL6915141

O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.[Zn+2]

nearest known ligand 0.54

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA2 P00918 14/20 0.54
CA1 P00915 13/20 0.54
MMP1 P03956 3/20 0.54
MMP2 P08253 3/20 0.54
MMP9 P14780 3/20 0.54
MMP8 P22894 3/20 0.54
MMP13 P45452 3/20 0.54
F2 P00734 4/20 0.43
PRSS1 P07477 4/20 0.43
PRSS2 P07478 4/20 0.43
PRSS3 P35030 4/20 0.43
LMNA P02545 1/20 0.33
THRB P10828 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Zinc Ion SCHEMBL6916840 1.00 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Zinc Ion SCHEMBL6912980 1.00 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Zinc Ion SCHEMBL6913039 0.97 CA2 (0.52) CA2CA1MMP1MMP2MMP9
SCHEMBL6914831 0.95 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Lithium Ion SCHEMBL18008092 0.95 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Potassium Ion SCHEMBL544675 0.95 CA2 (0.54) CA2CA1MMP1MMP2MMP9
SCHEMBL6914171 0.95 CA2 (0.54) CA2CA1MMP1MMP2MMP9
SCHEMBL6915441 0.95 CA2 (0.54) CA2CA1MMP1MMP2MMP9
SCHEMBL1496679 0.95 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Potassium Ion SCHEMBL4443223 0.95 CA2 (0.54) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6830704-B2 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. (JP) 2004-12-14 US disclosed
US-20030135016-A1 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. 2003-07-17 US disclosed
US-6547985-B1 Adhesive mixture TOGOSEI CO., LTD. (JP) 2003-04-15 US disclosed
EP-0102240-B1 METHOD FOR TREATING METALLIC OR CERAMIC SURFACES AT HIGH TEMPERATURES TEIJIN LIMITED (JP) 1990-10-31 EP disclosed
US-4497720-A LUBRICATING WITH MIXTURE OF POLYETHER AND A FLUORINE-CONTAINING SURFACTANT; ANTISLUDGING AGENTS; TEXTILES TEIJIN LIMITED (JP) 1985-02-05 US disclosed
EP-0102240-A2 Method for treating metallic or ceramic surfaces at high temperatures TEIJIN LIMITED (JP) 1984-03-07 EP disclosed