⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL27808643 | 0.97 | — | — | |
| SCHEMBL60043 | 0.96 | — | — | |
| SCHEMBL483026 | 0.96 | CYP2D6 (0.56) | — | |
| SCHEMBL8511067 | 0.93 | — | — | |
| Ammonia Solution, Strong SCHEMBL30916848 | 0.93 | — | — | |
| Hydrochloric Acid SCHEMBL29721561 | 0.93 | — | — | |
| SCHEMBL27510223 | 0.93 | — | — | |
| SCHEMBL9140511 | 0.93 | — | — | |
| Ethane SCHEMBL10904347 | 0.90 | — | — | |
| Benzene SCHEMBL28164580 | 0.90 | ALDH1A1 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102076505-A | Surface treatment composition, inkjet printable article and method of making the same | HEWLETT PACKARD DEVELOPMENT CO | 2011-05-25 | — | — | CN | claimed |
| CN-106062122-B | Abrasive grain, abrasive product and its preparation and application | 3M创新有限公司 | 2018-12-07 | — | — | CN | disclosed |
| CN-107820528-A | PRINTABLE FILM | 惠普发展公司，有限责任合伙企业 | 2018-03-20 | — | — | CN | disclosed |
| CN-107580556-A | Printable film | 惠普发展公司，有限责任合伙企业 | 2018-01-12 | — | — | CN | disclosed |
| CN-104350025-B | Abrasive particles, abrasive articles, and methods of making and using same | 3M创新有限公司 | 2017-02-22 | — | — | CN | disclosed |
| CN-106062122-A | Abrasive particles, abrasive articles, and methods of making and using the same | 3M创新有限公司 | 2016-10-26 | — | — | CN | disclosed |
| CN-105531121-A | Fabric print media | HEWLETT PACKARD DEVELOPMENT CO | 2016-04-27 | — | — | CN | disclosed |
| CN-102076505-A | Surface treatment composition, inkjet printable article and method of making the same | HEWLETT PACKARD DEVELOPMENT CO | 2011-05-25 | — | — | CN | disclosed |
| CN-1324403-C | Photosensitive lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2007-07-04 | — | — | CN | disclosed |
| US-6828078-B2 | Photoresist for use in optoelectronic and display fields; porosity; optical fibers | JSR CORPORATION (JP) | 2004-12-07 | — | — | US | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |
| CN-1353341-A | Photosensitive lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2002-06-12 | — | — | CN | disclosed |