SCHEMBL691686

SCHEMBL691686

CN(C)[Si](Cl)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2099962 0.74
SCHEMBL2099803 0.74
SCHEMBL22287317 0.74 ALDH1A1 (0.33)
SCHEMBL303170 0.74
SCHEMBL183750 0.74 ALDH1A1 (0.33)
Trimethylammonium SCHEMBL27262441 0.71
SCHEMBL4778725 0.70
SCHEMBL2100849 0.70
SCHEMBL22287352 0.65 ALDH1A1 (0.36)
SCHEMBL10591553 0.65 ALDH1A1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 237 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250299948-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM Kokusai Electric Corporation (JP) 2025-09-25 US disclosed
US-20250299949-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM Kokusai Electric Corporation (JP) 2025-09-25 US disclosed
US-12334334-B2 Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium Kokusai Electric Corporation (JP) 2025-06-17 US disclosed
US-12334336-B2 Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium Kokusai Electric Corporation (JP) 2025-06-17 US disclosed
CN-119040851-A Substrate processing method, semiconductor device manufacturing method, substrate processing apparatus, and recording medium 株式会社国际电气 2024-11-29 CN disclosed
CN-114807899-B Substrate processing method, semiconductor device manufacturing method, substrate processing apparatus, and recording medium 株式会社国际电气 2024-08-23 CN disclosed
CN-114807903-B Substrate processing method, semiconductor device manufacturing method, substrate processing apparatus, and recording medium 株式会社国际电气 2024-04-09 CN disclosed
US-20220246422-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM Kokusai Electric Corporation (JP) 2022-08-04 US disclosed
CN-114807899-A Method for manufacturing semiconductor device, method for processing substrate, substrate processing apparatus, and recording medium 株式会社国际电气 2022-07-29 CN disclosed
CN-114807903-A Method for manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium 株式会社国际电气 2022-07-29 CN disclosed
WO-1999054367-A1 CATALYST SYSTEM COMPOSED OF METALLOCENES COMPRISING SUBSTITUENTS CONTAINING FLUORINE TARGOR GMBH (DE) 1999-10-28 WO disclosed
WO-1999050312-A1 CATALYST SYSTEM, METHOD FOR THE PRODUCTION THEREOF, AND THE UTILIZATION THEREOF FOR THE POLYMERIZATION OF OLEFINS TARGOR GMBH (DE) 1999-10-07 WO disclosed
EP-0942938-A1 SUPPORTED CATALYST SYSTEM, METHOD FOR THE PRODUCTION AND USE THEREOF IN OLEFIN POLYMERIZATION Basell Polyolefine GmbH (DE) 1999-09-22 EP disclosed
WO-1999042497-A1 CATALYST SYSTEM, METHOD FOR THE PRODUCTION THEREOF AND ITS USE FOR THE POLYMERIZATION OF OLEFINS TARGOR GMBH (DE) 1999-08-26 WO disclosed
EP-0931099-A1 METHOD FOR PRODUCING OLEFIN POLYMERS WITH A HIGHER MELTING POINT Basell Polyolefine GmbH (DE) 1999-07-28 EP disclosed
WO-1999005152-A1 METHOD FOR PRODUCING METALLOCENES TARGOR GMBH (DE) 1999-02-04 WO disclosed
WO-1999005153-A1 METHOD FOR PRODUCING METALLOCENES TARGOR GMBH (DE) 1999-02-04 WO disclosed
WO-1998040419-A1 METHOD FOR PRODUCING OLEFIN POLYMERS WITH A HIGHER MELTING POINT TARGOR GMBH (DE) 1998-09-17 WO disclosed
WO-1998040416-A1 SUPPORTED CATALYST SYSTEM, METHOD FOR THE PRODUCTION AND USE THEREOF IN OLEFIN POLYMERIZATION TARGOR GMBH (DE) 1998-09-17 WO disclosed
EP-0780402-A1 Supported catalyst system, process for production of the same and the use thereof for the polymerization of olefins HOECHST AKTIENGESELLSCHAFT (DE) 1997-06-25 EP disclosed