SCHEMBL6922490

SCHEMBL6922490

O=S(=O)(O)c1ccc(OC(=C(C(F)(C(F)(F)F)C(F)(F)F)C(F)(C(F)(F)F)C(F)(F)F)C(F)(F)F)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 4/20 0.38
LMNA P02545 1/20 0.36
TSHR P16473 2/20 0.35
ALDH1A1 P00352 1/20 0.35
NT5E P21589 1/20 0.35
POLB P06746 2/20 0.34
MAPT P10636 1/20 0.34
PKM P14618 1/20 0.34
HSD11B1 P28845 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
PRTN3 P24158 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
KDM4E B2RXH2 1/20 0.31
CYP2D6 P10635 1/20 0.31
PRSS1 P07477 2/20 0.30
ACR P10323 2/20 0.30
PTPRZ1 P23471 1/20 0.30
CYP11B1 P15538 1/20 0.30
CYP11B2 P19099 1/20 0.30
CA12 O43570 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28148812 0.86 ELANE (0.37) ELANEPOLBMAPTPKMHSD11B1
SCHEMBL19107480 0.84 ELANE (0.45) ELANELMNATSHRALDH1A1NT5E
SCHEMBL10911053 0.82 ELANE (0.35) ELANELMNATSHRALDH1A1NT5E
SCHEMBL10910959 0.82 ELANE (0.35) ELANELMNATSHRALDH1A1NT5E
SCHEMBL14155779 0.78 ELANE (0.51) ELANELMNATSHRALDH1A1NT5E
SCHEMBL6825123 0.76 HSD17B10 (0.44) ELANETSHRALDH1A1PKMCA1
SCHEMBL15277882 0.73 CA1 (0.49) LMNAALDH1A1POLBMAPTTDP1
SCHEMBL29565053 0.70 ELANE (0.34) ELANEPOLBMAPTPKMHSD11B1
SCHEMBL10697499 0.70 ALDH1A1 (0.47) ELANELMNAALDH1A1POLBSMN1; SMN2
SCHEMBL3176978 0.69 FFAR4 (0.49) LMNATSHRALDH1A1NT5EMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6398875-B1 Process of drying semiconductor wafers using liquid or supercritical carbon dioxide INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-06-04 US claimed
CN-120117732-A Method for removing perfluoro and polyfluoroalkyl compounds 北京大学深圳研究生院 2025-06-10 CN disclosed
CN-115308319-A Quantitative method for non-targeted screening of perfluoro and polyfluoroalkyl compounds 北京大学 2022-11-08 CN disclosed
US-20170198161-A1 DEVIATION-PREVENTING COATING MATERIAL TOKAI OPTICAL CO., LTD. (JP) 2017-07-13 US disclosed
US-6739346-B2 Apparatus for cleaning filters INTERNATIONAL BUSINESS MACHINES CORPORATION 2004-05-25 US disclosed
US-20030196679-A1 Process and apparatus for contacting a precision surface with liquid or supercritical carbon dioxide INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-10-23 US disclosed
US-20030000556-A1 Apparatus for cleaning filters INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-01-02 US disclosed
US-6457480-B1 Process and apparatus for cleaning filters INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-10-01 US disclosed
US-6398875-B1 Process of drying semiconductor wafers using liquid or supercritical carbon dioxide INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-06-04 US disclosed