SCHEMBL6922741

SCHEMBL6922741

C#CCCC#CCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9723500 0.83 ALDH1A1 (0.33)
SCHEMBL21962097 0.82
SCHEMBL10422887 0.80 ALDH1A1 (0.47)
SCHEMBL8769406 0.71
SCHEMBL1985501 0.71
SCHEMBL1028327 0.71
SCHEMBL8945457 0.71 ALDH1A1 (0.32)
SCHEMBL11119707 0.71 ALDH1A1 (0.35)
SCHEMBL111375 0.71
SCHEMBL148914 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118772697-A Silica gel for digital printing and preparation method and application thereof 东莞市云轩新材料科技有限公司 2024-10-15 CN claimed
CN-116876242-B Silica gel for long-acting elliptical printing machine and preparation method and application thereof 东莞市云轩新材料科技有限公司 2024-06-28 CN claimed
CN-116876242-A Silica gel for long-acting elliptical printing machine and preparation method and application thereof 广州市云轩新材料科技有限公司 2023-10-13 CN claimed
US-6607868-B2 Dipropargyl acetamide HYNIX SEMICONDUCTOR INC. (KR) 2003-08-19 US claimed
US-20020012879-A1 Novel photoresist monomers, polymers thereof, and photoresist compositions containing the same HYNIX SEMICONDUCTOR INC. (KR) 2002-01-31 US claimed
CN-118772697-A Silica gel for digital printing and preparation method and application thereof 东莞市云轩新材料科技有限公司 2024-10-15 CN disclosed
CN-116876242-B Silica gel for long-acting elliptical printing machine and preparation method and application thereof 东莞市云轩新材料科技有限公司 2024-06-28 CN disclosed
CN-116876242-A Silica gel for long-acting elliptical printing machine and preparation method and application thereof 广州市云轩新材料科技有限公司 2023-10-13 CN disclosed
US-6607868-B2 Dipropargyl acetamide HYNIX SEMICONDUCTOR INC. (KR) 2003-08-19 US disclosed
US-6514666-B1 Photoresist monomers, polymers thereof and photoresist compositions containing it HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2003-02-04 US disclosed
US-20020012879-A1 Novel photoresist monomers, polymers thereof, and photoresist compositions containing the same HYNIX SEMICONDUCTOR INC. (KR) 2002-01-31 US disclosed