Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28316375 | 0.86 | KMT2A (0.47) | ALDH1A1 | |
| SCHEMBL6391544 | 0.85 | KMT2A (0.42) | ALDH1A1TSHR | |
| SCHEMBL28173526 | 0.85 | CYP1A2 (0.51) | ALDH1A1TSHR | |
| SCHEMBL5583415 | 0.79 | TSHR (0.54) | ALDH1A1TSHR | |
| SCHEMBL3096665 | 0.78 | ALDH1A1 (0.55) | ALDH1A1TSHR | |
| SCHEMBL3878722 | 0.76 | ALDH1A1 (0.53) | ALDH1A1TSHR | |
| SCHEMBL9583017 | 0.75 | ALDH1A1 (0.54) | ALDH1A1TSHR | |
| SCHEMBL10668707 | 0.75 | ALDH1A1 (0.51) | ALDH1A1TSHR | |
| SCHEMBL258592 | 0.75 | ALDH1A1 (0.51) | ALDH1A1TSHR | |
| SCHEMBL258742 | 0.75 | ALDH1A1 (0.51) | ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110361931-B | Antireflective hardmask composition | 厦门恒坤新材料科技股份有限公司 | 2022-08-05 | — | — | CN | claimed |
| CN-102060980-A | Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same | CHEIL IND INC | 2011-05-18 | — | — | CN | claimed |
| WO-2023070957-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | 嘉庚创新实验室 | 2023-05-04 | — | — | WO | disclosed |
| CN-105143390-B | Organic film chemical and mechanical grinding paste material constituent and the grinding method for using it | 三星SDI株式会社 | 2019-08-13 | — | — | CN | disclosed |
| CN-105555829-B | Polymers and compositions comprising the same | DNF有限公司 | 2017-08-01 | — | — | CN | disclosed |
| CN-102060980-B | Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same | CHEIL IND INC | 2013-12-11 | — | — | CN | disclosed |
| CN-102060980-A | Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same | CHEIL IND INC | 2011-05-18 | — | — | CN | disclosed |
| US-6514663-B1 | Bottom resist | INFINEON TECHNOLOGIES AG (DE) | 2003-02-04 | — | — | US | disclosed |