⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6930365 | 1.00 | — | — | |
| SCHEMBL27566442 | 1.00 | — | — | |
| SCHEMBL3062512 | 0.97 | — | — | |
| SCHEMBL4016780 | 0.97 | — | — | |
| SCHEMBL169924 | 0.97 | — | — | |
| SCHEMBL6928458 | 0.94 | — | — | |
| Ammonia Solution, Strong SCHEMBL27831159 | 0.94 | — | — | |
| SCHEMBL6929559 | 0.94 | — | — | |
| SCHEMBL27849642 | 0.94 | — | — | |
| Hydrochloric Acid SCHEMBL27867698 | 0.94 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102219763-B | Method for preparing chiral (2R,3R)-2,3-epoxy butyrate | UNIV HEBEI NORMAL | 2014-05-28 | — | — | CN | disclosed |
| CN-102219763-A | Method for preparing chiral (2R,3R)-2,3-epoxy butyrate | UNIV HEBEI NORMAL | 2011-10-19 | — | — | CN | disclosed |
| CN-1125059-C | Process for manufacturing optically active (S)-3,4-epoxybutyric acid salt | SAMSUNG FINE CHEMICALS CO LTD (KR) | 2003-10-22 | — | — | CN | disclosed |
| US-6586616-B1 | Cyanation and esterification of 3,4-epoxybutyric acid sodium salts to form chemical intermediates for antilipemic agents; by-product inhibition | SAMSUNG FINE CHEMICALS CO., LTD. (KR) | 2003-07-01 | — | — | US | disclosed |
| EP-1149068-A4 | A PROCESS FOR PREPARING (R)-4-CYANO-3-HYDROXYBUTYRIC ACID ESTER | SAMSUNG FINE CHEMICALS CO LTD (KR) | 2003-01-02 | — | — | EP | disclosed |
| EP-1109797-B1 | PROCESS FOR MANUFACTURING AN OPTICALLY ACTIVE (S)-3,4-EPOXYBUTYRIC ACID SALT | SAMSUNG FINE CHEMICALS CO LTD (KR) | 2002-03-27 | — | — | EP | disclosed |
| CN-1337940-A | Preparation process of -4-cyano-3-hydroxybutyrate | SAMSUNG FINE CHEMICALS CO LTD (KR) | 2002-02-27 | — | — | CN | disclosed |
| CN-1322199-A | Process for manufacturing optically active (S)-3,4-epoxybutyric acid salt | SAMSUNG FINE CHEMICALS CO LTD (KR) | 2001-11-14 | — | — | CN | disclosed |
| EP-1149068-A1 | A PROCESS FOR PREPARING (R)-4-CYANO-3-HYDROXYBUTYRIC ACID ESTER | Samsung Fine Chemicals Co., Ltd. (KR) | 2001-10-31 | — | — | EP | disclosed |
| US-6284902-B1 | Process for manufacturing an optically active (S)-3,4-epoxybutyric acid salt | SAMSUNG FINE CHEMICALS CO., LTD. (KR) | 2001-09-04 | — | — | US | disclosed |
| EP-1109797-A1 | PROCESS FOR MANUFACTURING AN OPTICALLY ACTIVE (S)-3,4-EPOXYBUTYRIC ACID SALT | Samsung Fine Chemicals Co., Ltd. (KR) | 2001-06-27 | — | — | EP | disclosed |
| WO-2000046186-A1 | A PROCESS FOR PREPARING (R)-4-CYANO-3-HYDROXYBUTYRIC ACID ESTER | SAMSUNG FINE CHEMICALS CO., LTD (KR) | 2000-08-10 | — | — | WO | disclosed |
| WO-2000005227-A1 | PROCESS FOR MANUFACTURING AN OPTICALLY ACTIVE (S)-3,4-EPOXYBUTYRIC ACID SALT | SAMSUNG FINE CHEMICALS CO., LTD. (KR) | 2000-02-03 | — | — | WO | disclosed |