SCHEMBL6936445

SCHEMBL6936445

CC(=O)OC(=CO)c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.44
CES2 O00748 5/20 0.43
CES1 P23141 5/20 0.43
TSHR P16473 2/20 0.42
ALDH1A1 P00352 4/20 0.41
CYP3A4 P08684 1/20 0.41
F2 P00734 1/20 0.40
LMNA P02545 1/20 0.40
DAO P14920 1/20 0.39
NAPRT Q6XQN6 1/20 0.39
MAPK1 P28482 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
AKT1 P31749 2/20 0.38
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
MTNR1A P48039 1/20 0.37
MTNR1B P49286 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9848557 0.86 ELANE (0.46) ELANECES2CES1TSHRALDH1A1
SCHEMBL29180078 0.86 ELANE (0.46) ELANECES2CES1TSHRALDH1A1
SCHEMBL9848566 0.86 ELANE (0.46) ELANECES2CES1TSHRALDH1A1
SCHEMBL11421432 0.82 ELANE (0.43) ELANECES2CES1TSHRALDH1A1
SCHEMBL11421430 0.82 ELANE (0.43) ELANECES2CES1TSHRALDH1A1
SCHEMBL6551358 0.82 LMNA (0.52) CES2CES1TSHRALDH1A1F2
SCHEMBL10006253 0.81 AKR1C3 (0.50) ELANETSHRALDH1A1LMNAMAPK1
SCHEMBL21086761 0.81 ELANE (0.42) ELANECES2CES1TSHRALDH1A1
SCHEMBL4982106 0.81 AKR1C3 (0.50) ELANETSHRALDH1A1LMNAMAPK1
SCHEMBL9333553 0.79 CES1 (0.44) ELANECES2CES1TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0568993-B1 Chemical amplification resist composition KYOWA HAKKO KOGYO KK (JP) 1998-08-12 EP claimed
US-5527659-A PHOTOSENSITIVITY KYOWA HAKKO KOGYO CO., LTD. (JP) 1996-06-18 US claimed
EP-0568993-A2 Chemical amplification resist composition KYOWA HAKKO KOGYO CO., LTD. (JP) 1993-11-10 EP claimed
US-RE38251-E1 Dihydroperimidines IMATION CORP. 2003-09-16 US disclosed
US-6605416-B2 Using squarylium dye IMATION CORP. 2003-08-12 US disclosed
US-20010008748-A1 COMPOSITIONS AND PROCESSES FOR PHOTOGENERATION OF ACID IMATION CORP. 2001-07-19 US disclosed
EP-0898734-A1 COMPOSITIONS AND PROCESSES FOR PHOTOGENERATION OF ACID Imation Corp. (US) 1999-03-03 EP disclosed
EP-0568993-B1 Chemical amplification resist composition KYOWA HAKKO KOGYO KK (JP) 1998-08-12 EP disclosed
US-5763134-A Composition comprising photochemical acid progenitor and specific squarylium dye IMATION CORP (US) 1998-06-09 US disclosed
WO-1997043695-A1 COMPOSITIONS AND PROCESSES FOR PHOTOGENERATION OF ACID MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-11-20 WO disclosed
US-5527659-A PHOTOSENSITIVITY KYOWA HAKKO KOGYO CO., LTD. (JP) 1996-06-18 US disclosed
EP-0568993-A2 Chemical amplification resist composition KYOWA HAKKO KOGYO CO., LTD. (JP) 1993-11-10 EP disclosed