SCHEMBL6956309

SCHEMBL6956309

CC(=O)Nc1cccc2c(=O)cc(C(=N)NN)oc12

nearest known ligand 0.71

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
GPR35 Q9HC97 15/20 0.71
POLB P06746 2/20 0.47
MAPT P10636 2/20 0.47
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47
ALDH1A1 P00352 1/20 0.47
GPR55 Q9Y2T6 1/20 0.47
RECQL P46063 1/20 0.43
CYSLTR2 Q9NS75 1/20 0.42
CYSLTR1 Q9Y271 1/20 0.42
NPC1 O15118 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6961111 0.87 GPR35 (0.73) GPR35MEN1KMT2AALDH1A1GPR55
SCHEMBL7896951 0.85 GPR35 (0.74) GPR35ALDH1A1GPR55NPC1
SCHEMBL6951328 0.82 GPR35 (0.57) GPR35ALDH1A1CYSLTR2CYSLTR1
SCHEMBL6952499 0.82 GPR35 (0.57) GPR35ALDH1A1CYSLTR2CYSLTR1
SCHEMBL7896949 0.82 GPR35 (0.74) GPR35POLBMAPTMEN1KMT2A
SCHEMBL6953450 0.82 GPR35 (0.76) GPR35KMT2AGPR55CYSLTR2CYSLTR1
SCHEMBL6955023 0.80 GPR35 (0.62) GPR35GPR55CYSLTR2CYSLTR1
SCHEMBL6961849 0.79 GPR35 (0.66) GPR35MAPTGPR55CYSLTR2CYSLTR1
SCHEMBL6961252 0.79 GPR35 (0.61) GPR35GPR55CYSLTR2CYSLTR1
SCHEMBL6956919 0.79 GPR35 (0.57) GPR35GPR55CYSLTR2CYSLTR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed