SCHEMBL6960427

SCHEMBL6960427

CC(=O)Nc1ccc2oc(C(=N)NN)cc(=O)c2c1

nearest known ligand 0.58

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.58
POLB P06746 4/20 0.58
MEN1 O00255 3/20 0.58
MAPT P10636 1/20 0.58
MAOB P27338 8/20 0.51
MAOA P21397 5/20 0.51
CSNK2A2 P19784 1/20 0.49
CSNK2B P67870 1/20 0.49
CSNK2A1 P68400 1/20 0.49
RXFP1 Q9HBX9 1/20 0.46
NPC1 O15118 1/20 0.46
HTT P42858 1/20 0.46
RAB9A P51151 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
ACHE P22303 1/20 0.44
KDM4E B2RXH2 1/20 0.44
ALDH1A1 P00352 1/20 0.44
ESR1 P03372 1/20 0.44
HPGD P15428 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6954183 0.86 MAOB (0.48) KMT2APOLBMEN1MAPTMAOB
SCHEMBL5560749 0.84 KMT2A (0.60) KMT2APOLBMEN1MAPTMAOB
SCHEMBL6960638 0.83 MAOB (0.57) KMT2APOLBMEN1MAPTMAOB
SCHEMBL7899220 0.82 KMT2A (0.57) KMT2APOLBMEN1MAPTMAOB
SCHEMBL6963052 0.81 SMN1; SMN2 (0.48) POLBMAPTMAOBMAOANPC1
SCHEMBL6957586 0.81 SMN1; SMN2 (0.48) POLBMAPTMAOBMAOANPC1
SCHEMBL6961380 0.81 MAOA (0.61) KMT2APOLBMEN1MAPTMAOB
SCHEMBL6951795 0.80 MAOA (0.52) KMT2APOLBMEN1MAPTMAOB
SCHEMBL6957308 0.79 POLB (0.66) KMT2APOLBMEN1MAPTMAOB
SCHEMBL6952243 0.79 MAOA (0.50) KMT2APOLBMEN1MAPTMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed