SCHEMBL6960842

SCHEMBL6960842

c1ccc(COc2ccccc2-c2nnn[nH]2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BRD4 O60885 4/20 0.51
PDE5A O76074 1/20 0.51
PDE4A P27815 1/20 0.51
PDE4B Q07343 1/20 0.51
PDE4C Q08493 1/20 0.51
PDE4D Q08499 1/20 0.51
IDO1 P14902 1/20 0.50
MAPT P10636 1/20 0.44
MAPK1 P28482 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
LTA4H P09960 1/20 0.43
MAPK14 Q16539 1/20 0.43
SGMS2 Q8NHU3 1/20 0.42
CNR1 P21554 1/20 0.41
CNR2 P34972 1/20 0.41
HTR1A P08908 1/20 0.41
DRD2 P14416 1/20 0.41
RXRA P19793 1/20 0.41
RXRB P28702 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6953203 0.85 IDO1 (0.52) BRD4PDE5APDE4APDE4BPDE4C
SCHEMBL8678497 0.85 CCNB2 (0.53) BRD4PDE5APDE4APDE4BPDE4C
SCHEMBL6963013 0.83 IDO1 (0.49) BRD4PDE5APDE4APDE4BPDE4C
SCHEMBL6960625 0.82 IDO1 (0.48) PDE5APDE4APDE4BPDE4CPDE4D
SCHEMBL6952842 0.82 IDO1 (0.48) PDE5APDE4APDE4BPDE4CPDE4D
SCHEMBL6956795 0.81 PDE5A (0.49) PDE5AL3MBTL1
SCHEMBL6961624 0.79 PDE5A (0.51) PDE5APDE4APDE4BPDE4CPDE4D
SCHEMBL7710931 0.78 CYSLTR1 (0.53)
SCHEMBL3729028 0.78 TSHR (0.40) MAPK1L3MBTL1MAPK14HTR1A
SCHEMBL6957680 0.78 PDE5A (0.52) PDE5APDE4APDE4BPDE4CPDE4D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed