SCHEMBL6953203

SCHEMBL6953203

c1ccc(CCOc2ccccc2-c2nnn[nH]2)cc1

nearest known ligand 0.52

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 4/20 0.52
GP6 Q9HCN6 2/20 0.42
CYP11B1 P15538 7/20 0.42
CYP11B2 P19099 7/20 0.42
TNF P01375 1/20 0.38
PDE5A O76074 1/20 0.38
PDE4A P27815 1/20 0.38
PDE4B Q07343 1/20 0.38
PDE4C Q08493 1/20 0.38
PDE4D Q08499 1/20 0.38
BRD4 O60885 1/20 0.37
CYP19A1 P11511 2/20 0.36
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
MAOA P21397 1/20 0.36
MAOB P27338 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6963013 0.92 IDO1 (0.49) IDO1GP6PDE5APDE4APDE4B
SCHEMBL6960625 0.91 IDO1 (0.48) IDO1PDE5APDE4APDE4BPDE4C
SCHEMBL6952842 0.91 IDO1 (0.48) IDO1PDE5APDE4APDE4BPDE4C
SCHEMBL6960842 0.85 BRD4 (0.51) IDO1PDE5APDE4APDE4BPDE4C
SCHEMBL6961624 0.82 PDE5A (0.51) PDE5APDE4APDE4BPDE4CPDE4D
SCHEMBL6957680 0.81 PDE5A (0.52) PDE5APDE4APDE4BPDE4CPDE4D
SCHEMBL6956795 0.79 PDE5A (0.49) PDE5A
SCHEMBL6961933 0.79 PDE5A (0.54) PDE5APDE4APDE4BPDE4CPDE4D
SCHEMBL6959641 0.79 PDE5A (0.54) PDE5APDE4APDE4BPDE4CPDE4D
SCHEMBL6949662 0.77 GP6 (0.54) GP6NPC1RAB9AMAOAMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed