SCHEMBL6961787

SCHEMBL6961787

CCCOc1ccc(C(=N)NN)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PLK1 P53350 1/20 0.54
PRSS1 P07477 6/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
TMPRSS2 O15393 2/20 0.49
PRMT1 Q99873 3/20 0.47
F2 P00734 2/20 0.47
ST14 Q9Y5Y6 2/20 0.47
PLAU P00749 1/20 0.47
PRSS2 P07478 1/20 0.47
PRSS3 P35030 1/20 0.47
PRMT5 O14744 1/20 0.47
LTA4H P09960 1/20 0.47
SLC22A2 O15244 1/20 0.47
SLC22A1 O15245 1/20 0.47
PTP4A3 O75365 1/20 0.47
SLC22A3 O75751 1/20 0.47
F10 P00742 1/20 0.47
PLG P00747 1/20 0.47
S100B P04271 1/20 0.47
CHRM2 P08172 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6960720 0.93 GAA (0.54) PRSS1TMPRSS2PRMT1F2ST14
SCHEMBL6956710 0.89 TP53 (0.58) PRSS1TMPRSS2PRMT1F2ST14
SCHEMBL6957533 0.89 TP53 (0.58) PRSS1TMPRSS2PRMT1F2ST14
SCHEMBL6961256 0.86 PRSS1 (0.65) PLK1PRSS1PRSS2PRSS3LTA4H
SCHEMBL3275310 0.84 PLK1 (0.56) PLK1PRSS1L3MBTL1TMPRSS2LTA4H
SCHEMBL6954288 0.81 KMT2A (0.59) PRSS1F2PRSS2PRSS3PLG
SCHEMBL19486142 0.81 PLK1 (0.49) PLK1PRSS1L3MBTL1TMPRSS2PRMT1
SCHEMBL9647355 0.80 PRSS1 (0.78) PRSS1TMPRSS2PRMT1F2ST14
SCHEMBL19486504 0.80 PLK1 (0.48) PLK1PRSS1L3MBTL1TMPRSS2PRMT1
SCHEMBL19486507 0.80 L3MBTL1 (0.48) PLK1PRSS1L3MBTL1TMPRSS2PRMT1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed