SCHEMBL700124

SCHEMBL700124

C/C=C/CC=C(C)C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.35
GRIK2 Q13002 4/20 0.34
GRIK1 P39086 3/20 0.34
PPARG P37231 2/20 0.34
BACE1 P56817 1/20 0.33
CD81 P60033 1/20 0.32
CYP2C9 P11712 1/20 0.32
PTGS1 P23219 2/20 0.31
FNTA P49354 1/20 0.31
FNTB P49356 1/20 0.31
ALDH1A1 P00352 2/20 0.30
MAPT P10636 2/20 0.30
KDM4E B2RXH2 1/20 0.30
ATM Q13315 1/20 0.30
FFAR1 O14842 1/20 0.30
CYP19A1 P11511 1/20 0.30
RXRA P19793 1/20 0.30
OXER1 Q8TDS5 1/20 0.30
F13A1 P00488 1/20 0.30
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3126999 1.00 AKR1C3 (0.35) AKR1C3GRIK2GRIK1PPARGBACE1
SCHEMBL852778 1.00 AKR1C3 (0.35) AKR1C3GRIK2GRIK1PPARGBACE1
SCHEMBL9486204 0.87 AKR1C3 (0.39) AKR1C3GRIK2PPARGBACE1CD81
SCHEMBL9486198 0.87 AKR1C3 (0.39) AKR1C3GRIK2PPARGBACE1CD81
SCHEMBL4389988 0.85 GRIK2 (0.34) AKR1C3GRIK2GRIK1PPARGPTGS1
SCHEMBL4389981 0.85 GRIK2 (0.34) AKR1C3GRIK2GRIK1PPARGPTGS1
SCHEMBL1774518 0.82 AKR1C3 (0.42) AKR1C3GRIK2PPARGBACE1CD81
SCHEMBL1774515 0.82 AKR1C3 (0.42) AKR1C3GRIK2PPARGBACE1CD81
SCHEMBL6972821 0.81 AKR1C3 (0.35) AKR1C3GRIK2PPARGCD81CYP2C9
SCHEMBL35841 0.81 AKR1C3 (0.35) AKR1C3GRIK2PPARGCD81CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080004402-A1 Polymeric product for film formation BORBELY JANOS 2008-01-03 US claimed
US-20240003099-A1 AN ANTI-ICING LAMINATE MATERIAL AND THE USE THEREOF DOW CHEMICAL (CHINA) INVESTMENT COMPANY LIMITED (CN) 2024-01-04 US disclosed
US-10597549-B2 Coating composition for glossy ink receptive media LUBRIZOL ADVANCED MATERIALS, INC. 2020-03-24 US disclosed
US-20190194485-A1 COATING COMPOSITION FOR GLOSSY INK RECEPTIVE MEDIA LUBRIZOL ADVANCED MATERIALS, INC. 2019-06-27 US disclosed
EP-3490806-A1 COATING COMPOSITION FOR GLOSSY INK RECEPTIVE MEDIA Lubrizol Advanced Materials, Inc. (US) 2019-06-05 EP disclosed
US-9938225-B2 Biomass-derived methyl methacrylate and corresponding manufacturing method, uses and polymers ARKEMA FRANCE (FR) 2018-04-10 US disclosed
WO-2018026718-A1 COATING COMPOSITION FOR GLOSSY INK RECEPTIVE MEDIA LUBRIZOL ADVANCED MATERIALS, INC. (US) 2018-02-08 WO disclosed
US-9803114-B2 Acrylic adhesive composition with controlled molecular weight 3M INNOVATIVE PROPERTIES COMPANY (US) 2017-10-31 US disclosed
US-9394459-B2 Coating composition LUBRIZOL ADVANCED MATERIALS, INC. (US) 2016-07-19 US disclosed
US-9353286-B2 Powder compositions ALLNEX ITALY SRL (IT) 2016-05-31 US disclosed
US-20050158663-A1 Regenerative plate making and printing process, and plate making and printing apparatus MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2005-07-21 US disclosed
US-6897007-B2 Method for forming image LASTRA S.P.A. (IT) 2005-05-24 US disclosed
US-20050048404-A1 Method for forming image and apparatus for forming image LASTRA S.P.A. (IT) 2005-03-03 US disclosed
US-6861202-B2 Method for treating photosensitive lithographic printing plate LASTRA S.P.A. (IT) 2005-03-01 US disclosed
US-6664306-B2 Melt processable composition comprising dendritic polymer having plurality of pendent free-radically polymerizable functional groups and polymeric photoinitiator 3M INNOVATIVE PROPERTIES COMPANY 2003-12-16 US disclosed
US-20030212210-A1 Reactive oligomers 3M INNOVATIVE PROPERTIES COMPANY 2003-11-13 US disclosed
US-20030194654-A1 Method for treating photosensitive lithographic printing plate MITSUBISHI CHEMICAL CORPORATION (JP) 2003-10-16 US disclosed
US-6558875-B1 Exposing the photosensitive lithographic printing plate to laser light, developing with a developer containing an alkali metal silicate and then carrying out post-exposure treatment using a mercury lamp MITSUBISHI CHEMICAL CORPORATION (JP) 2003-05-06 US disclosed
US-20020177071-A1 Method for forming image and apparatus for forming image MITSUBISHI CHEMICAL CORPORATION (JP) 2002-11-28 US disclosed
EP-1243412-A1 Method for forming image and apparatus for forming image MITSUBISHI CHEMICAL CORPORATION (JP) 2002-09-25 EP disclosed