⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2488770 | 0.89 | — | — | |
| SCHEMBL794942 | 0.80 | — | — | |
| SCHEMBL5154739 | 0.80 | — | — | |
| SCHEMBL1535875 | 0.76 | — | — | |
| SCHEMBL1535876 | 0.76 | — | — | |
| SCHEMBL8047753 | 0.76 | — | — | |
| SCHEMBL13929991 | 0.76 | — | — | |
| SCHEMBL969271 | 0.76 | — | — | |
| SCHEMBL11016251 | 0.76 | — | — | |
| SCHEMBL13446223 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2325694-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2017-11-08 | — | — | EP | disclosed |
| CN-102150083-B | Radiation-sensitive resin composition, and resist pattern formation method | JSR CORP | 2013-09-04 | — | — | CN | disclosed |
| US-8124314-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20110262865-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2011-10-27 | — | — | US | disclosed |
| EP-1697311-B1 | NITRILE COMPOUND AND ITS USE IN PEST CONTROL | SUMITOMO CHEMICAL CO (JP) | 2011-10-26 | — | — | EP | disclosed |
| US-20110212401-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-09-01 | — | — | US | disclosed |
| CN-102150083-A | Radiation-sensitive resin composition, and resist pattern formation method | JSR CORP | 2011-08-10 | — | — | CN | disclosed |
| EP-2325694-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2011-05-25 | — | — | EP | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-7662402-B2 | contains fluoroalkyl group; insecticides, miticides, nematocides | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-02-16 | — | — | US | disclosed |
| US-7517635-B2 | Polyester compound and resist material using the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-04-14 | — | — | US | disclosed |
| CN-100390140-C | Nitrile compounds and their use in pest control | SUMITOMO CHEMICAL CO (JP) | 2008-05-28 | — | — | CN | disclosed |
| US-20080050674-A1 | Polyester compound and resist material using the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-02-28 | — | — | US | disclosed |
| US-20070112068-A1 | Nitrile compound and its use in pest control | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-05-17 | — | — | US | disclosed |
| EP-1697311-A1 | NITRILE COMPOUND AND ITS USE IN PEST CONTROL | Sumitomo Chemical Company, Limited (JP) | 2006-09-06 | — | — | EP | disclosed |
| WO-2005063694-A1 | NITRILE COMPOUND AND ITS USE IN PEST CONTROL | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-07-14 | — | — | WO | disclosed |