⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13446223 | 1.00 | — | — | |
| SCHEMBL13929991 | 1.00 | — | — | |
| SCHEMBL19846101 | 1.00 | — | — | |
| SCHEMBL11016251 | 1.00 | — | — | |
| SCHEMBL1535876 | 1.00 | — | — | |
| SCHEMBL794942 | 0.95 | — | — | |
| SCHEMBL8740867 | 0.88 | LMNA (0.44) | — | |
| SCHEMBL15325988 | 0.88 | LMNA (0.44) | — | |
| SCHEMBL16544531 | 0.88 | — | — | |
| SCHEMBL22930367 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230400764-A1 | ORGANOMETALLIC COMPOUND COMPRISING A METAL COMBINED WITH AT LEAST ONE LIGAND CONTAINING FOUR OR MORE FLUORINE ATOMS, RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-12-14 | — | — | US | disclosed |
| US-20110014567-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-6077928-A | Bis(dialkylmaleimide) derivative and polyetherimide for optical communications formed therefrom | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-06-20 | — | — | US | disclosed |
| US-6031061-A | Bis (triaklyltrimellitic anhydride) derivative and polyesterimide for optical communications formed therefrom | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-02-29 | — | — | US | disclosed |