SCHEMBL7002418

SCHEMBL7002418

O=c1oc(=O)c2cc3cc4cc5c(=O)oc(=O)c5cc4cc3cc12

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 7/20 0.38
PDE2A O00408 1/20 0.37
PTGES O14684 1/20 0.35
CYP1A2 P05177 2/20 0.35
PKLR P30613 3/20 0.34
POLB P06746 3/20 0.34
MAPT P10636 3/20 0.34
GALNT2 Q10471 2/20 0.34
KDM4E B2RXH2 2/20 0.34
GPR35 Q9HC97 2/20 0.34
LMNA P02545 2/20 0.34
TP53 P04637 2/20 0.34
CYP2C9 P11712 2/20 0.34
ALOX15 P16050 2/20 0.34
CYP2C19 P33261 2/20 0.34
BLM P54132 2/20 0.34
HSD17B10 Q99714 2/20 0.34
MEN1 O00255 1/20 0.34
PLK4 O00444 1/20 0.34
IKBKB O14920 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5146405 0.97 ELANE (0.39) ELANEPDE2APTGESCYP1A2PKLR
SCHEMBL15763 0.83 CYP1A2 (0.43) ELANEPDE2APTGESCYP1A2PKLR
SCHEMBL12672598 0.82 KDM4E (0.35) ELANEPOLBMAPTKDM4EALDH1A1
SCHEMBL19753965 0.80 PIM1 (0.41) ELANEPDE2APTGESCYP1A2PKLR
SCHEMBL17456072 0.80 CYP1A2 (0.42) ELANEPDE2APTGESCYP1A2PKLR
SCHEMBL25994740 0.80 CYP1A2 (0.42) ELANEPDE2APTGESCYP1A2PKLR
SCHEMBL10406762 0.80 CYP1A2 (0.42) ELANEPDE2APTGESCYP1A2PKLR
SCHEMBL12664896 0.80 TDP1 (0.41) ELANEPDE2APTGESCYP1A2PKLR
SCHEMBL5888745 0.78 ELANE (0.55) ELANEPTGESCYP1A2POLBMAPT
SCHEMBL22639027 0.78 GPR35 (0.48) CYP1A2POLBKDM4EGPR35LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114149444-B Method for synthesizing 2,3,6,7-anthracene tetracarboxylic dianhydride 常州市阳光药业有限公司 2022-11-15 CN disclosed
CN-114854010-A Polyimide precursor, polyimide film, and substrate 宇部兴产株式会社 2022-08-05 CN disclosed
CN-109312071-B Polyimide precursor, polyimide film and substrate, and tetracarboxylic dianhydride used for producing polyimide 宇部兴产株式会社 2022-06-14 CN disclosed
CN-114149444-A Synthesis method of 2,3,6, 7-anthracene tetracarboxylic dianhydride 常州市阳光药业有限公司 2022-03-08 CN disclosed
US-10437107-B2 Liquid-crystal display element DIC CORPORATION (JP) 2019-10-08 US disclosed
US-20160349574-A1 LIQUID-CRYSTAL DISPLAY ELEMENT DIC CORPORATION (JP) 2016-12-01 US disclosed
US-20160349574-A1 LIQUID-CRYSTAL DISPLAY ELEMENT DIC CORPORATION (JP) 2016-12-01 US disclosed
US-20160306236-A1 LIQUID-CRYSTAL DISPLAY ELEMENT DIC CORPORATION (JP) 2016-10-20 US disclosed
US-20160306236-A1 LIQUID-CRYSTAL DISPLAY ELEMENT DIC CORPORATION (JP) 2016-10-20 US disclosed
EP-3064991-A1 LIQUID-CRYSTAL DISPLAY ELEMENT DIC Corporation (JP) 2016-09-07 EP disclosed
US-20110109855-A1 POLYAMIC ACID AND A POLYIMIDE OBTAINED BY REACTING A DIANHYDRIDE AND A DIAMINE SONY CORPORATION (JP) 2011-05-12 US disclosed
US-20110109855-A1 POLYAMIC ACID AND A POLYIMIDE OBTAINED BY REACTING A DIANHYDRIDE AND A DIAMINE SONY CORPORATION (JP) 2011-05-12 US disclosed
US-20070106057-A1 Polyimide resin, method of producing polyimide resin, and electrolyte membrane, catalyst layer, membrane/electrode assembly and device each containing polyimide resin YAMANASHI, UNIVERSITY OF (JP) 2007-05-10 US disclosed
US-20070106057-A1 Polyimide resin, method of producing polyimide resin, and electrolyte membrane, catalyst layer, membrane/electrode assembly and device each containing polyimide resin YAMANASHI, UNIVERSITY OF (JP) 2007-05-10 US disclosed
US-6638707-B2 Image forming layer containing an organic silver salt; either the image forming layer or the interlayer contains an alkoxy silane compound having at least two primary or secondary amino groups or Schiff base formed by reaction with a ketone KONICA CORPORATION (JP) 2003-10-28 US disclosed
US-20030044738-A1 Photothermographic material KONICA CORPORATION (JP) 2003-03-06 US disclosed
EP-1271235-A1 Photothermographic material KONICA CORPORATION (JP) 2003-01-02 EP disclosed