SCHEMBL700903

SCHEMBL700903

CCCOc1ccc(S2(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)CCCC2)c2ccccc12

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.40
MEN1 O00255 3/20 0.40
TSHR P16473 3/20 0.36
CNR1 P21554 1/20 0.34
CNR2 P34972 1/20 0.34
HTT P42858 1/20 0.33
MCOLN3 Q8TDD5 1/20 0.33
ALDH1A1 P00352 1/20 0.33
LMNA P02545 1/20 0.33
SLC2A1 P11166 1/20 0.32
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31
FABP4 P15090 6/20 0.30
FABP5 Q01469 6/20 0.30
PLA2G1B P04054 1/20 0.30
HSP90AA1 P07900 1/20 0.30
ATG4B Q9Y4P1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL701333 0.99 KMT2A (0.41) KMT2AMEN1TSHRCNR1CNR2
SCHEMBL448403 0.95 SLC2A1 (0.37) KMT2AMEN1TSHRCNR1CNR2
SCHEMBL190940 0.94 SLC2A1 (0.38) KMT2AMEN1TSHRCNR1CNR2
SCHEMBL704518 0.92 TSHR (0.41) KMT2AMEN1TSHRHTTMCOLN3
SCHEMBL3965828 0.91 MEN1 (0.31) KMT2AMEN1TSHRHTTMCOLN3
SCHEMBL3119750 0.91 TSHR (0.42) KMT2AMEN1TSHRHTTMCOLN3
SCHEMBL3975128 0.90 MEN1 (0.32) KMT2AMEN1TSHRHTTMCOLN3
SCHEMBL3973420 0.89 HTT (0.34) TSHRHTTMCOLN3ALDH1A1LMNA
SCHEMBL3970056 0.88 HTT (0.31) TSHRHTTMCOLN3ALDH1A1LMNA
SCHEMBL703653 0.88 KMT2A (0.44) KMT2AMEN1TSHRCNR1CNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120164586-A1 PATERN FORMING METHOD JSR CORPORATION (JP) 2012-06-28 US disclosed
US-8124314-B2 Radiation-sensitive composition JSR CORPORATION (JP) 2012-02-28 US disclosed
US-20100221664-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-09-02 US disclosed
US-20100203452-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-08-12 US disclosed