SCHEMBL703653

SCHEMBL703653

CCCOc1ccc(S2(OS(=O)(=O)C(F)(F)F)CCCC2)c2ccccc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.44
MEN1 O00255 3/20 0.44
TSHR P16473 3/20 0.39
CNR1 P21554 2/20 0.37
CNR2 P34972 2/20 0.37
SLC2A1 P11166 1/20 0.35
FABP4 P15090 7/20 0.35
FABP5 Q01469 7/20 0.35
HTT P42858 1/20 0.34
MCOLN3 Q8TDD5 1/20 0.34
ALDH1A1 P00352 1/20 0.34
LMNA P02545 1/20 0.34
PLA2G1B P04054 1/20 0.33
HSP90AA1 P07900 1/20 0.33
ATG4B Q9Y4P1 1/20 0.33
CYP2A6 P11509 1/20 0.33
FABP3 P05413 1/20 0.33
DRD2 P14416 1/20 0.32
DRD1 P21728 1/20 0.32
DRD4 P21917 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL36281 0.94 SLC2A1 (0.41) KMT2AMEN1TSHRCNR1CNR2
SCHEMBL36663 0.91 TSHR (0.43) KMT2AMEN1TSHRSLC2A1FABP4
SCHEMBL2520945 0.90 HTT (0.36) KMT2AMEN1TSHRSLC2A1FABP4
SCHEMBL701333 0.89 KMT2A (0.41) KMT2AMEN1TSHRCNR1CNR2
SCHEMBL700903 0.88 KMT2A (0.40) KMT2AMEN1TSHRCNR1CNR2
SCHEMBL2517298 0.87 TSHR (0.35) KMT2AMEN1TSHRSLC2A1FABP4
SCHEMBL2521576 0.87 HTT (0.32) KMT2AMEN1TSHRSLC2A1HTT
SCHEMBL2516237 0.86 MEN1 (0.32) KMT2AMEN1FABP4FABP5LMNA
SCHEMBL3973457 0.85 FABP4 (0.39) FABP4HTTLMNAL3MBTL1
SCHEMBL36503 0.85 ALDH1A1 (0.39) SLC2A1FABP4ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120164586-A1 PATERN FORMING METHOD JSR CORPORATION (JP) 2012-06-28 US disclosed
US-8124314-B2 Radiation-sensitive composition JSR CORPORATION (JP) 2012-02-28 US disclosed
US-20100221664-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-09-02 US disclosed
US-20100203452-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-08-12 US disclosed