Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 1/20 | 0.45 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.45 |
| ▸ | CETP | P11597 | 7/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28230674 | 0.87 | CYP4F2 (0.45) | CYP4F2CYP4A11CETPCYP2C19MEN1 | |
| SCHEMBL28154962 | 0.85 | CYP4F2 (0.44) | CYP4F2CYP4A11CETPCYP2C19MEN1 | |
| SCHEMBL5052685 | 0.82 | CYP4F2 (0.50) | CYP4F2CYP4A11CETPCYP2C19MEN1 | |
| SCHEMBL23384 | 0.81 | CYP4F2 (0.49) | CYP4F2CYP4A11CETPCYP2C19MEN1 | |
| SCHEMBL28199817 | 0.81 | CYP4F2 (0.67) | CYP4F2CYP4A11CETPCYP2C19MEN1 | |
| SCHEMBL8408805 | 0.81 | CYP4F2 (0.46) | CYP4F2CYP4A11CETPCYP2C19MEN1 | |
| SCHEMBL21399965 | 0.79 | CYP4F2 (0.47) | CYP4F2CYP4A11CETPMEN1KMT2A | |
| SCHEMBL11088776 | 0.79 | CYP4F2 (0.69) | CYP4F2CYP4A11CETPMEN1KMT2A | |
| SCHEMBL7059027 | 0.79 | CYP4F2 (0.50) | CYP4F2CYP4A11CETPCYP2C19MEN1 | |
| SCHEMBL28630718 | 0.78 | CYP4F2 (0.46) | CYP4F2CYP4A11CETPMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10928727-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing | FUJIFILM CORPORATION (JP) | 2021-02-23 | — | — | US | disclosed |
| US-10423068-B2 | Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2019-09-24 | — | — | US | disclosed |
| US-20180120701-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| US-20170242338-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-08-24 | — | — | US | disclosed |
| US-20170174801-A1 | NON-CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION, NON-CHEMICAL AMPLIFICATION TYPE RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-06-22 | — | — | US | disclosed |
| US-20170176858-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2017-06-22 | — | — | US | disclosed |
| US-9323150-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| US-9188862-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | FUJIFILM CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-20140295332-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2014-10-02 | — | — | US | disclosed |
| US-20140227636-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-08-14 | — | — | US | disclosed |
| US-20060147837-A1 | Resist composition | FUJI PHOTO FILM CO., LTD. | 2006-07-06 | — | — | US | disclosed |
| US-6902862-B2 | Resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-06-07 | — | — | US | disclosed |
| EP-1465010-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-10-06 | — | — | EP | disclosed |
| US-6733951-B2 | HIGH RESOLUTION IN PATTERN FORMATION BY IRRADIATION WITH ACITINIC RAY; FOR PRODUCTION OF LITHOGRAPHIC PRINTING PLATES AND SEMICONDUCTORS/INTEGRATED CIRCUITS FOR LIQUID CRYSTALS AND THERMAL HEADS | FUJI PHOTO FILM CO., LTD. (JP) | 2004-05-11 | — | — | US | disclosed |
| US-20040058272-A1 | Resist composition | FUJI PHOTO FILM CO., LTD. | 2004-03-25 | — | — | US | disclosed |
| US-20040005513-A1 | Resist composition | FUJI PHOTO FILM CO., LTD. | 2004-01-08 | — | — | US | disclosed |
| US-6605409-B2 | Includes a compound that generates a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having an acid decomposable group which increases solubility in an alkali developer; improved resolving power | FUJI PHOTO FILM CO., LTD. (JP) | 2003-08-12 | — | — | US | disclosed |
| US-20030075708-A1 | Positive radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-04-24 | — | — | US | disclosed |
| US-20020006578-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-01-17 | — | — | US | disclosed |
| EP-1158363-A1 | Positive resist composition and onium salts of saccharin derivatives | FUJI PHOTO FILM CO., LTD. (JP) | 2001-11-28 | — | — | EP | disclosed |