⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL28209223 | 1.00 | — | — | |
| Fluoride SCHEMBL27546939 | 1.00 | — | — | |
| Methane SCHEMBL27676032 | 0.82 | — | — | |
| Fluoride SCHEMBL6443670 | 0.82 | — | — | |
| Fluoride SCHEMBL17600627 | 0.82 | — | — | |
| Fluoride SCHEMBL11205647 | 0.82 | — | — | |
| Fluoride SCHEMBL9318976 | 0.71 | — | — | |
| Fluoride SCHEMBL38465 | 0.71 | — | — | |
| Fluoride Ion F-18 SCHEMBL12714265 | 0.71 | — | — | |
| Fluoride SCHEMBL49263 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113877535-B | Hydrogen fluoride adsorbent and preparation method and application thereof | 江苏新泰材料科技有限公司 | 2024-03-22 | — | — | CN | claimed |
| CN-108376570-B | FLiNaK molten salt, preparation method thereof, reactor and preparation device | 中国科学院上海应用物理研究所 | 2019-12-10 | — | — | CN | claimed |
| CN-108376570-A | A kind of FLiNaK fused salts and preparation method thereof, reactor and preparation facilities | 中国科学院上海应用物理研究所 | 2018-08-07 | — | — | CN | claimed |
| US-6627001-B2 | Method for cleaning a semiconductor wafer | MACRONIX INTERNATIONAL CO., LTD. (TW) | 2003-09-30 | — | — | US | claimed |
| US-20020166572-A1 | Method for cleaning a semiconductor wafer | MACRONIX INTERNATIONAL CO., LTD. (TW) | 2002-11-14 | — | — | US | claimed |
| EP-1038311-A1 | SYSTEM AND METHOD FOR ETCHING ORGANIC ANTI-REFLECTIVE COATING FROM A SUBSTRATE | Applied Materials, Inc. (US) | 2000-09-27 | — | — | EP | claimed |
| WO-1999030360-A1 | SYSTEM AND METHOD FOR ETCHING ORGANIC ANTI-REFLECTIVE COATING FROM A SUBSTRATE | APPLIED MATERIALS, INC. (US) | 1999-06-17 | — | — | WO | claimed |
| CN-113877535-B | Hydrogen fluoride adsorbent and preparation method and application thereof | 江苏新泰材料科技有限公司 | 2024-03-22 | — | — | CN | disclosed |
| CN-108807223-B | Substrate processing apparatus and substrate processing method | 株式会社斯库林集团 | 2022-03-01 | — | — | CN | disclosed |
| CN-110416184-B | Semiconductor structure and forming method thereof | 台湾积体电路制造股份有限公司 | 2021-10-08 | — | — | CN | disclosed |
| CN-108336127-B | Silicon carbide substrate, semiconductor device, and methods for manufacturing silicon carbide substrate and semiconductor device | 住友电气工业株式会社 | 2021-09-24 | — | — | CN | disclosed |
| CN-106406021-B | Protective film and photomask assembly including the same | 三星电子株式会社 | 2021-09-14 | — | — | CN | disclosed |
| EP-2423356-B1 | PROCESS FOR PRODUCING INDIUM-PHOSPHORUS SUBSTRATE AND PROCESS FOR PRODUCING EPITAXIAL WAFER | SUMITOMO ELECTRIC INDUSTRIES (JP) | 2020-10-07 | — | — | EP | disclosed |
| WO-1999030360-A1 | SYSTEM AND METHOD FOR ETCHING ORGANIC ANTI-REFLECTIVE COATING FROM A SUBSTRATE | APPLIED MATERIALS, INC. (US) | 1999-06-17 | — | — | WO | disclosed |
| EP-0848088-A1 | A method for treating a suface of a silicon single crystal and a method for manufacturing a silicon single crystal thin film | SHIN-ETSU HANDOTAI COMPANY LIMITED (JP) | 1998-06-17 | — | — | EP | disclosed |
| EP-0810643-A2 | Method for cleaning a porous surface of a semiconductor substrate | CANON KABUSHIKI KAISHA (JP) | 1997-12-03 | — | — | EP | disclosed |
| CN-1166693-A | Cleaning methods of porous surface and semiconductor surface | CANON KK (JP) | 1997-12-03 | — | — | CN | disclosed |
| CN-1131817-A | Method for forming multilevel interconnections in semiconductor device | NEC CORP (JP) | 1996-09-25 | — | — | CN | disclosed |
| WO-1989002416-A1 | INTEGRATED COAL CLEANING PROCESS WITH MIXED ACID REGENERATION | WILLIAMS TECHNOLOGIES, INC. (US) | 1989-03-23 | — | — | WO | disclosed |
| US-4695290-A | Integrated coal cleaning process with mixed acid regeneration | INTEGRATED CARBONS CORPORATION (US) | 1987-09-22 | — | — | US | disclosed |