SCHEMBL7022922

SCHEMBL7022922

CCN1C(=O)C(=CC=C2Sc3ccccc3N2CC)SC1=S

nearest known ligand 0.87

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 16/20 0.87
KMT2A Q03164 16/20 0.87
MAPT P10636 14/20 0.87
ALDH1A1 P00352 11/20 0.87
MAPK1 P28482 9/20 0.87
THRB P10828 3/20 0.87
LMNA P02545 1/20 0.87
SMN1; SMN2 Q16637 6/20 0.83
OPRK1 P41145 1/20 0.83
NPC1 O15118 4/20 0.64
RAB9A P51151 4/20 0.64
KDM4E B2RXH2 2/20 0.57
NPSR1 Q6W5P4 2/20 0.57
TDP1 Q9NUW8 2/20 0.57
CRHBP P24387 2/20 0.54
CRHR2 Q13324 2/20 0.54
TNNI3 P19429 2/20 0.54
TNNT2 P45379 2/20 0.54
TNNC1 P63316 2/20 0.54
CYP1A2 P05177 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7022919 1.00 MEN1 (0.87) MEN1KMT2AMAPTALDH1A1MAPK1
SCHEMBL10036064 1.00 MEN1 (0.87) MEN1KMT2AMAPTALDH1A1MAPK1
SCHEMBL30767820 1.00 MEN1 (0.87) MEN1KMT2AMAPTALDH1A1MAPK1
SCHEMBL11688292 0.93 MEN1 (0.76) MEN1KMT2AMAPTALDH1A1MAPK1
SCHEMBL10036009 0.93 MEN1 (0.76) MEN1KMT2AMAPTALDH1A1MAPK1
SCHEMBL11688300 0.93 MEN1 (0.76) MEN1KMT2AMAPTALDH1A1MAPK1
SCHEMBL13345430 0.92 MEN1 (0.78) MEN1KMT2AMAPTALDH1A1MAPK1
SCHEMBL10036091 0.91 MEN1 (0.77) MEN1KMT2AMAPTALDH1A1MAPK1
SCHEMBL10331919 0.90 MEN1 (0.79) MEN1KMT2AMAPTALDH1A1MAPK1
SCHEMBL14301214 0.90 MEN1 (0.79) MEN1KMT2AMAPTALDH1A1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4252895-A 1,3,4-THIADIAZOLE COMPOUND ORIENTAL PHOTO INDUSTRIAL CO., LTD. (JP) 1981-02-24 US claimed
US-3958991-A PHOTOCONDUCTOR EASTMAN KODAK COMPANY (US) 1976-05-25 US claimed
US-20100239962-A1 TWO-PHOTON ABSORBING OPTICAL RECORDING MATERIAL AND TWO-PHOTON ABSORBING OPTICAL RECORDING AND REPRODUCING METHOD FUJIFILM CORPORATION (JP) 2010-09-23 US disclosed
US-7771915-B2 Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method FUJIFILM CORPORATION (JP) 2010-08-10 US disclosed
US-7582390-B2 Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method FUJIFILM CORPORATION (JP) 2009-09-01 US disclosed
US-7582391-B2 Two-photon absorption decolorizable material, two-photon absorption refractive index modulation material, two-photon absorption polymerization material, two-photon absorption polymerization method and three-dimensional optical recording material FUJIFILM CORPORATION (JP) 2009-09-01 US disclosed
US-7531667-B2 Two-photon absorption dye-containing material, three-dimensional refractive index modulation material, three-dimensional absorption index modulation material and three-dimensional optical recording material FUJIFILM CORPORATION (JP) 2009-05-12 US disclosed
US-7470015-B2 Inkjet-recording ink composition and image-forming process FUJIFILM CORPORATION (JP) 2008-12-30 US disclosed
US-7470015-B2 Inkjet-recording ink composition and image-forming process FUJIFILM CORPORATION (JP) 2008-12-30 US disclosed
US-7229737-B2 Photopolymerizable composition and recording material and recording process using the same FUJIFILM CORPORATION (JP) 2007-06-12 US disclosed
US-7229737-B2 Photopolymerizable composition and recording material and recording process using the same FUJIFILM CORPORATION (JP) 2007-06-12 US disclosed
US-5698345-A CATIONIC POLYMERIZATION OF THERMOSETTING EPOXY OLIGOMER TOPPAN PRINTING CO., LTD. (JP) 1997-12-16 US disclosed
EP-0738928-A2 Visible-ray polymerization initiator and visible-ray polymerizable composition TOKUYAMA CORPORATION (JP) 1996-10-23 EP disclosed
EP-0697631-A1 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium Toppan Printing Co., Ltd. (JP) 1996-02-21 EP disclosed
EP-0672953-A2 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium Toppan Printing Co., Ltd. (JP) 1995-09-20 EP disclosed
US-4259424-A INFRARED RAYS-ABSORBING LAYER IN CONTACT WITH LAYER CONTAINING REDUCIBLE SILVER SALT CANON KABUSHIKI KAISHA (JP) 1981-03-31 US disclosed
US-4152152-A Additives for contrast control in organic photoconductor compositions and elements EASTMAN KODAK COMPANY (US) 1979-05-01 US disclosed
US-3977880-A Direct-positive emulsion containing silver halide grains internally doped with metal ions, surface ripened with gold and sulfur compound and fogged by light exposure FUJI PHOTO FILM CO., LTD. (JA) 1976-08-31 US disclosed
US-3970459-A Process for developing a direct reversal silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JA) 1976-07-20 US disclosed
US-3933509-A Photo-polymerizable composition containing an acid salt of an indolinobenzospiropyran FUJI PHOTO FILM CO., LTD. (JA) 1976-01-20 US disclosed