SCHEMBL7026463

SCHEMBL7026463

C[C](C)C(O)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7024179 0.76
SCHEMBL579123 0.74
SCHEMBL21816671 0.73
SCHEMBL16684617 0.70
SCHEMBL23721 0.67
SCHEMBL868487 0.67
SCHEMBL490224 0.67
SCHEMBL868391 0.67
SCHEMBL5146 0.65
SCHEMBL1681247 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2002021216-A9 POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING ELECTRONEGATIVE GROUPS SHIPLEY CO LLC (US) 2003-04-03 WO claimed
US-20020058199-A1 Novel polymers and photoresist compositions comprising electronegative groups SHIPLEY COMPANY, L.L.C. 2002-05-16 US claimed
WO-2002021216-A2 POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING ELECTRONEGATIVE GROUPS SHIPLEY COMPANY, L.L.C. (US) 2002-03-14 WO claimed
US-8835095-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-09-16 US disclosed
CN-103965099-A Pyridylaminoacetic Acid Compound UBE INDUSTRIES 2014-08-06 CN disclosed
US-8778594-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-07-15 US disclosed
CN-101970410-B Pyridylaminoacetic acid compounds UBE INDUSTRIES 2014-06-25 CN disclosed
CN-101874019-B Process for preparing isoindole derivatives and process for preparing intermediates thereof HOFFMANN LA ROCHE 2013-06-12 CN disclosed
US-20130022915-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-01-24 US disclosed
CN-102666490-A Aminopyridine compound UBE INDUSTRIES 2012-09-12 CN disclosed
US-20120219905-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-08-30 US disclosed
CN-102548985-A Substituted carbonyl compounds UBE INDUSTRIES 2012-07-04 CN disclosed
CN-102498099-A HSL inhibitors useful in the treatment of diabetes HOFFMANN LA ROCHE 2012-06-13 CN disclosed
CN-102448940-A Pharmaceutical composition for treating or preventing glaucoma UBE INDUSTRIES 2012-05-09 CN disclosed
CN-102421777-A Azacyclospiro derivatives as HSL inhibitors HOFFMANN LA ROCHE 2012-04-18 CN disclosed
CN-101970410-A Pyridylaminoacetic acid compounds UBE INDUSTRIES 2011-02-09 CN disclosed
CN-101874019-A Process for preparing isoindole derivatives and process for preparing intermediates thereof HOFFMANN LA ROCHE 2010-10-27 CN disclosed
CN-101160285-A Substituted sulfonylaminoarylmethyl cyclopropanecarboxamide as vr1 receptor antagonists PFIZER (US) 2008-04-09 CN disclosed
CN-101111480-A Substituted pyridone derivative BANYU PHARMA CO LTD (JP) 2008-01-23 CN disclosed