Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | MGLL | Q99685 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29686363 | 0.95 | ALDH1A1 (0.34) | MEN1KMT2AALDH1A1 | |
| SCHEMBL8075376 | 0.86 | MEN1 (0.32) | MEN1KMT2AMGLL | |
| SCHEMBL7988737 | 0.75 | MEN1 (0.33) | MEN1KMT2A | |
| SCHEMBL29226550 | 0.75 | HPGD (0.37) | MEN1KMT2ATP53ALDH1A1 | |
| SCHEMBL22042224 | 0.74 | MEN1 (0.45) | MEN1KMT2AMGLL | |
| SCHEMBL8873668 | 0.74 | MEN1 (0.30) | MEN1KMT2A | |
| SCHEMBL19436427 | 0.73 | MEN1 (0.32) | MEN1KMT2A | |
| SCHEMBL9639066 | 0.73 | EPHX1 (0.35) | KMT2A | |
| SCHEMBL8322398 | 0.72 | MEN1 (0.37) | MEN1KMT2ASLC6A3MGLL | |
| SCHEMBL3839822 | 0.72 | MEN1 (0.34) | MEN1KMT2ASLC6A3ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0829766-B1 | Novel polymers and photoresist compositions | SHIPLEY CO LLC (US) | 2003-02-12 | — | — | EP | disclosed |
| US-6090526-A | CHEMICALLY-AMPLIFIED POSITIVE-ACTING RESIN BINDER HAVING PHENOLIC UNITS AND ACETALESTER OR KETALESTER UNITS; DEPROTECTION; ACID-GENERATING PHOTOCATALYST; RESOLUTION; FINENESS; ETCHING RESISTANCE, ESPECIALLY HALOGEN COMPOUNDS | SHIPLEY COMPANY, L.L.C. (US) | 2000-07-18 | — | — | US | disclosed |
| EP-0829766-A2 | Novel polymers and photoresist compositions | Shipley Company LLC (US) | 1998-03-18 | — | — | EP | disclosed |