SCHEMBL7033604

SCHEMBL7033604

CC1(C)C=C(c2ccc(O)cc2)CC(C)(C)C1O

nearest known ligand 0.50

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 2/20 0.50
▸ ESR2 Q92731 12/20 0.35
▸ QDPR P09417 2/20 0.34
▸ ESR1 P03372 6/20 0.33
▸ MEN1 O00255 1/20 0.32
▸ NPC1 O15118 1/20 0.32
▸ USP2 O75604 1/20 0.32
▸ TP53 P04637 1/20 0.32
▸ MAPT P10636 1/20 0.32
▸ PKM P14618 1/20 0.32
▸ NFKB1 P19838 1/20 0.32
▸ RAB9A P51151 1/20 0.32
▸ NFKB2 Q00653 1/20 0.32
▸ KMT2A Q03164 1/20 0.32
▸ RELA Q04206 1/20 0.32
▸ KDM1A O60341 1/20 0.30
▸ HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7196040 0.69 SMN1; SMN2 (0.42) SMN1; SMN2ESR2QDPRESR1KDM1A
SCHEMBL11033224 0.69 SMN1; SMN2 (0.42) SMN1; SMN2ESR2QDPRESR1KDM1A
SCHEMBL20392266 0.67 SMN1; SMN2 (0.51) SMN1; SMN2ESR2QDPRESR1NPC1
SCHEMBL3134427 0.66 SMN1; SMN2 (0.50) SMN1; SMN2ESR2QDPRESR1HSD17B10
Hydrochloric Acid SCHEMBL8476099 0.66 SMN1; SMN2 (0.97) SMN1; SMN2ESR2QDPRESR1KMT2A
SCHEMBL24839989 0.62 SMN1; SMN2 (0.46) SMN1; SMN2ESR2QDPRESR1MEN1
SCHEMBL5077540 0.62 SMN1; SMN2 (0.46) SMN1; SMN2ESR2QDPRESR1MEN1
Cyclohexane SCHEMBL6426374 0.60 ESR1 (0.69) SMN1; SMN2ESR2ESR1MEN1NPC1
Hydroquinone SCHEMBL4071158 0.59 ALOX15 (0.80) SMN1; SMN2ESR2ESR1MEN1NPC1
Hydroquinone SCHEMBL4309201 0.59 ALOX15 (0.80) SMN1; SMN2ESR2ESR1MEN1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1290058-A2 PROCESS FOR MANUFACTURING A HYDROXYESTER DERIVATIVE INTERMEDIATE AND EPOXY RESINS PREPARED THEREFROM DOW GLOBAL TECHNOLOGIES INC. (US) 2003-03-12 — — EP claimed
WO-2001088013-A2 PROCESS FOR MANUFACTURING A HYDROXYESTER DERIVATIVE INTERMEDIATE AND EPOXY RESINS PREPARED THEREFROM DOW GLOBAL TECHNOLOGIES INC (US) 2001-11-22 — — WO claimed
US-12460048-B2 Thermoplastic resin composition and formed product MITSUBISHI CHEMICAL CORPORATION (JP) 2025-11-04 — — US disclosed
EP-4640743-A1 ELECTRONIC BOARD MATERIAL, RESIN, AND METHOD FOR PRODUCING RESIN Idemitsu Kosan Co.,Ltd. (JP) 2025-10-29 — — EP disclosed
EP-4640742-A1 ELECTRONIC SUBSTRATE MATERIAL, RESIN, AND METHOD FOR MANUFACTURING RESIN Idemitsu Kosan Co.,Ltd. (JP) 2025-10-29 — — EP disclosed
EP-4640741-A1 ELECTRONIC SUBSTRATE MATERIAL, RESIN AND METHOD FOR PRODUCING RESIN Idemitsu Kosan Co.,Ltd. (JP) 2025-10-29 — — EP disclosed
EP-4023698-B1 THERMOPLASTIC RESIN COMPOSITION AND FORMED PRODUCT MITSUBISHI CHEM CORP (JP) 2025-10-22 — — EP disclosed
WO-2024135762-A1 ELECTRONIC BOARD MATERIAL, RESIN, AND METHOD FOR PRODUCING RESIN 出光興産株式会社 2024-06-27 — — WO disclosed
WO-2024135760-A1 ELECTRONIC SUBSTRATE MATERIAL, RESIN AND METHOD FOR PRODUCING RESIN 出光興産株式会社 2024-06-27 — — WO disclosed
WO-2024135761-A1 ELECTRONIC SUBSTRATE MATERIAL, RESIN, AND METHOD FOR MANUFACTURING RESIN 出光興産株式会社 2024-06-27 — — WO disclosed
EP-4023698-A1 THERMOPLASTIC RESIN COMPOSITION AND MOLDED ARTICLE Mitsubishi Chemical Corporation (JP) 2022-07-06 — — EP disclosed
US-20220195114-A1 THERMOPLASTIC RESIN COMPOSITION AND FORMED PRODUCT MITSUBISHI CHEMICAL CORPORATION (JP) 2022-06-23 — — US disclosed
CN-114302905-A Thermoplastic resin composition and molded article 三菱化学株式会社 2022-04-08 — — CN disclosed
WO-2021039970-A1 THERMOPLASTIC RESIN COMPOSITION AND MOLDED ARTICLE 三菱ケミカル株式会社 2021-03-04 — — WO disclosed
WO-1985004176-A1 A PROCESS FOR PREPARAING VINYL ESTER RESINS CONTAINING TRIAZINE OR BOTH TRIAZINE AND OXAZOLINE GROUPS THE DOW CHEMICAL COMPANY (US) 1985-09-26 — — WO disclosed
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