SCHEMBL7034902

SCHEMBL7034902

C=C(C)C(=O)O[Si](C)(C)C(C)C

nearest known ligand 0.45

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.45
ALDH1A1 P00352 2/20 0.44
THRB P10828 1/20 0.33
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7634439 0.86 TSHR (0.45) TSHRALDH1A1THRBTDP1
SCHEMBL28418082 0.85
SCHEMBL28760826 0.79 TSHR (0.44) TSHRALDH1A1THRB
SCHEMBL31015810 0.78 TSHR (0.46) TSHRALDH1A1THRBTDP1
SCHEMBL1963691 0.78 TSHR (0.46) TSHRALDH1A1THRBTDP1
SCHEMBL7143131 0.78 TSHR (0.46) TSHRALDH1A1THRBTDP1
SCHEMBL476054 0.77 TSHR (0.39) TSHRALDH1A1
SCHEMBL8956843 0.77 ALDH1A1 (0.46) TSHRALDH1A1
SCHEMBL476052 0.75
SCHEMBL23000640 0.74 TSHR (0.43) TSHRALDH1A1THRBTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114621388-B Resin polymer, photo-curing composition and application thereof 常州强力电子新材料股份有限公司 2023-12-08 CN claimed
CN-114621388-A Resin polymer, photocuring composition and application thereof 常州强力电子新材料股份有限公司 2022-06-14 CN claimed
CN-114326299-A Photosensitive resin composition, optical filter and application 常州强力电子新材料股份有限公司 2022-04-12 CN claimed
CN-114326309-A Photosensitive resin composition and application thereof 常州正洁智造科技有限公司 2022-04-12 CN claimed
CN-115368583-B Multi-branched polymer, alkali-soluble resin, and photocurable composition 常州强力先端电子材料有限公司 2024-04-09 CN disclosed
CN-114621388-B Resin polymer, photo-curing composition and application thereof 常州强力电子新材料股份有限公司 2023-12-08 CN disclosed
CN-115368583-A Multi-branched polymer, alkali-soluble resin, and photocurable composition 常州强力先端电子材料有限公司 2022-11-22 CN disclosed
CN-114621388-A Resin polymer, photocuring composition and application thereof 常州强力电子新材料股份有限公司 2022-06-14 CN disclosed
CN-114326299-A Photosensitive resin composition, optical filter and application 常州强力电子新材料股份有限公司 2022-04-12 CN disclosed
CN-114326309-A Photosensitive resin composition and application thereof 常州正洁智造科技有限公司 2022-04-12 CN disclosed
CN-103658097-A Cleaning process JOTUN AS 2014-03-26 CN disclosed
CN-1886360-A Novel cycloalkenycarboxylic acid and its uses CHUGOKU MARINE PAINTS (JP) 2006-12-27 CN disclosed
EP-0942018-B1 (METH)ACRYLIC ESTER COPOLYMERS AND PROCESS FOR PRODUCING THE SAME NIPPON SODA CO (JP) 2003-03-12 EP disclosed
US-6218485-B1 LIVING ANIONIC POLYMERIZATION USING AN ORGANIC ALKALI METAL AND/OR AN ALKALI METAL AS A POLYMERIZATION INITIATOR, WHEREIN A TARGET MOLECULAR WEIGHT IS OBTAINED BY ADDING THE COMPOUND DIVIDED INTO MULTIPLE STEPS. NIPPON SODA CO., LTD. (JP) 2001-04-17 US disclosed
EP-0942018-A1 (METH)ACRYLIC ESTER COPOLYMERS AND PROCESS FOR PRODUCING THE SAME NIPPON SODA CO., LTD. (JP) 1999-09-15 EP disclosed