Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.58 |
| ▸ | MGLL | Q99685 | 6/20 | 0.40 |
| ▸ | DHFR | P00374 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9637139 | 0.91 | ALDH1A1 (0.58) | ALDH1A1MGLLDHFR | |
| SCHEMBL3805892 | 0.90 | ALDH1A1 (0.68) | ALDH1A1MGLLDHFR | |
| Ethylene SCHEMBL28219719 | 0.89 | ALDH1A1 (0.66) | ALDH1A1MGLLDHFR | |
| Phthalic Acid SCHEMBL31350915 | 0.89 | ALDH1A1 (0.69) | ALDH1A1MGLLDHFR | |
| Styrene SCHEMBL27895306 | 0.87 | ALDH1A1 (0.59) | ALDH1A1MGLL | |
| SCHEMBL28219720 | 0.87 | ALDH1A1 (0.62) | ALDH1A1MGLLDHFR | |
| Methacrylic Acid SCHEMBL28339301 | 0.86 | ALDH1A1 (0.58) | ALDH1A1MGLL | |
| SCHEMBL27780693 | 0.86 | ALDH1A1 (0.61) | ALDH1A1MGLL | |
| Styrene SCHEMBL10914482 | 0.84 | ALDH1A1 (0.66) | ALDH1A1MGLL | |
| Styrene SCHEMBL8536901 | 0.84 | ALDH1A1 (0.66) | ALDH1A1MGLL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6797451-B2 | SEMICONDUCTOR SUBSTRATES; FORMING PHOTORESIST PATTERNS | HYNIX SEMICONDUCTOR INC. (KR) | 2004-09-28 | — | — | US | claimed |
| US-20030018150-A1 | Reflection-inhibiting resinn used in process for forming photoresist pattern | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-23 | — | — | US | claimed |
| US-20030018150-A1 | Reflection-inhibiting resinn used in process for forming photoresist pattern | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-23 | — | — | US | disclosed |