SCHEMBL7042848

SCHEMBL7042848

CCCC(CC)CCN1CCCC1=O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PIK3CD O00329 1/20 0.47
KMT2A Q03164 2/20 0.42
MEN1 O00255 1/20 0.40
PKM P14618 1/20 0.40
TSHR P16473 3/20 0.39
BRD4 O60885 1/20 0.38
BRD2 P25440 1/20 0.38
LMNA P02545 3/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA3 P07451 1/20 0.38
CA4 P22748 1/20 0.38
CA6 P23280 1/20 0.38
CA5A P35218 1/20 0.38
CA7 P43166 1/20 0.38
CA9 Q16790 1/20 0.38
CA13 Q8N1Q1 1/20 0.38
CA14 Q9ULX7 1/20 0.38
CA5B Q9Y2D0 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19185659 0.95 PIK3CD (0.42) PIK3CDKMT2AMEN1PKMTSHR
SCHEMBL19185719 0.86 PIK3CD (0.46) PIK3CDKMT2AMEN1PKMTSHR
SCHEMBL9368688 0.85 PIK3CD (0.46) PIK3CDKMT2AMEN1PKMTSHR
SCHEMBL9368750 0.85 PIK3CD (0.46) PIK3CDKMT2AMEN1PKMTSHR
SCHEMBL22548335 0.84 PIK3CD (0.42) PIK3CDKMT2AMEN1PKMTSHR
SCHEMBL8269849 0.82 GAA (0.42) PIK3CDKMT2AMEN1
SCHEMBL28355014 0.81 PIK3CD (0.39) PIK3CDKMT2AMEN1PKMADRA1B
SCHEMBL22600522 0.81 PIK3CD (0.53) PIK3CDKMT2AMEN1PKMTSHR
SCHEMBL22548332 0.81 PIK3CD (0.45) PIK3CDKMT2AMEN1PKMTSHR
SCHEMBL11670310 0.80 PIK3CD (0.47) PIK3CDKMT2AMEN1PKMTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1167789-C Detergent ɽ����ʽ���� 2004-09-22 CN disclosed
US-6576600-B1 Such as propylene glycol alkyl ether adduct, imidazolidinone compound and water; degreasing and cleaning metal surfaces; halogen free TOKUYAMA CORPORATION (JP) 2003-06-10 US disclosed
US-20030040456-A1 Method and apparatus for cleaning article TOKUYAMA CORPORATION (JP) 2003-02-27 US disclosed
CN-1392805-A Method and apparatus for washing articles TOKUYAMA CORP (JP) 2003-01-22 CN disclosed
CN-1322234-A Detergent TOKUYAMA CORP (JP) 2001-11-14 CN disclosed