SCHEMBL704472

SCHEMBL704472

CC[Si](Cl)(Cl)C[Si](Cl)(Cl)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12752671 0.85
SCHEMBL118715 0.82
SCHEMBL9409582 0.78
SCHEMBL704573 0.75
SCHEMBL3678974 0.75 ALDH1A1 (0.39)
SCHEMBL5027516 0.72
SCHEMBL1262109 0.72
SCHEMBL2099699 0.69
SCHEMBL4077622 0.69
SCHEMBL704043 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250230301-A1 RUBBER COMPOSITION FOR HEAVY-DUTY TIRES ZEON CORPORATION (JP) 2025-07-17 US disclosed
US-20250197612-A1 RUBBER COMPOSITION FOR SIDEWALL ZS ELASTOMERS CO., LTD. (JP) 2025-06-19 US disclosed
EP-4502035-A1 RUBBER COMPOSITION FOR HEAVY-DUTY TIRES ZS Elastomers Co., Ltd. (JP) 2025-02-05 EP disclosed
EP-4484487-A1 RUBBER COMPOSITION FOR HEAVY-LOAD TIRE ZS Elastomers Co., Ltd. (JP) 2025-01-01 EP disclosed
EP-4484488-A1 RUBBER COMPOSITION FOR SIDEWALL ZS Elastomers Co., Ltd. (JP) 2025-01-01 EP disclosed
US-11999827-B2 Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same MERCK PATENT GMBH (DE) 2024-06-04 US disclosed
EP-4146725-B1 POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME MERCK PATENT GMBH (DE) 2024-05-22 EP disclosed
US-20240010820-A1 RUBBER COMPOSITION FOR HEAVY-LOAD TIRE ZS ELASTOMERS CO., LTD. (JP) 2024-01-11 US disclosed
EP-4223553-A1 RUBBER COMPOSITION FOR HEAVY-LOAD TIRE ZS Elastomers Co., Ltd. (JP) 2023-08-09 EP disclosed
US-20230174724-A1 POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME MERCK PATENT GMBH (DE) 2023-06-08 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-20100056709-A1 CONJUGATED DIENE POLYMER, CONJUGATED DIENE POLYMER COMPOSITION, AND METHOD FOR PRODUCING CONJUGATED DIENE POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-04 US disclosed
US-20100056710-A1 CONJUGATED DIENE POLYMER, CONJUGATED DIENE POLYMER COMPOSITION, AND METHOD FOR PRODUCING CONJUGATED DIENE POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-04 US disclosed
US-20100056713-A1 CONJUGATED DIENE POLYMER, CONJUGATED DIENE POLYMER COMPOSITION, AND METHOD FOR PRODUCING CONJUGATED DIENE POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-04 US disclosed
US-20100056703-A1 CONJUGATED DIENE POLYMER, CONJUGATED DIENE POLYMER COMPOSITION, AND METHOD FOR PRODUCING CONJUGATED DIENE POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-04 US disclosed
US-20100056711-A1 CONJUGATED DIENE POLYMER CONJUGATED DIENE POLYMER COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-04 US disclosed
US-20100056712-A1 CONJUGATED DIENE POLYMER, CONJUGATED DIENE POLYMER COMPOSITION, AND METHOD FOR PRODUCING CONJUGATED DIENE POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-04 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20090247692-A1 CONJUGATED DIENE POLYMER, CONJUGATED DIENE POLYMER COMPOSITION, AND PROCESS FOR PRODUCING CONJUGATED DIENE POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-10-01 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed