SCHEMBL7045768

SCHEMBL7045768

CC(C)(C12C=CC(C1)C(C(=O)O)C2)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
GRM2 Q14416 2/20 0.33
GRM3 Q14832 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7046493 0.90 GRM2 (0.33) GRM2GRM3
SCHEMBL7048136 0.87 HSD11B1 (0.32)
SCHEMBL8051059 0.81 GRM2 (0.34) GRM2
SCHEMBL7049169 0.77 GRM2 (0.32) GRM2
SCHEMBL4170806 0.74
SCHEMBL4174620 0.74 HSD11B1 (0.32)
SCHEMBL7047053 0.73
SCHEMBL7046520 0.73
SCHEMBL7047003 0.72
SCHEMBL4169949 0.72 KDM4E (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 US disclosed